FR2883661B1 - MULTI-LAYER CHANNEL FIELD EFFECT TRANSISTOR WITH MULTI-LAYER CHANNEL - Google Patents
MULTI-LAYER CHANNEL FIELD EFFECT TRANSISTOR WITH MULTI-LAYER CHANNELInfo
- Publication number
- FR2883661B1 FR2883661B1 FR0603975A FR0603975A FR2883661B1 FR 2883661 B1 FR2883661 B1 FR 2883661B1 FR 0603975 A FR0603975 A FR 0603975A FR 0603975 A FR0603975 A FR 0603975A FR 2883661 B1 FR2883661 B1 FR 2883661B1
- Authority
- FR
- France
- Prior art keywords
- layer channel
- field effect
- effect transistor
- channel field
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000005669 field effect Effects 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/785—Field effect transistors with field effect produced by an insulated gate having a channel with a horizontal current flow in a vertical sidewall of a semiconductor body, e.g. FinFET, MuGFET
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78684—Thin film transistors, i.e. transistors with a channel being at least partly a thin film having a semiconductor body comprising semiconductor materials of Group IV not being silicon, or alloys including an element of the group IV, e.g. Ge, SiN alloys, SiC alloys
- H01L29/78687—Thin film transistors, i.e. transistors with a channel being at least partly a thin film having a semiconductor body comprising semiconductor materials of Group IV not being silicon, or alloys including an element of the group IV, e.g. Ge, SiN alloys, SiC alloys with a multilayer structure or superlattice structure
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Thin Film Transistor (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0603975A FR2883661B1 (en) | 2006-05-04 | 2006-05-04 | MULTI-LAYER CHANNEL FIELD EFFECT TRANSISTOR WITH MULTI-LAYER CHANNEL |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0603975A FR2883661B1 (en) | 2006-05-04 | 2006-05-04 | MULTI-LAYER CHANNEL FIELD EFFECT TRANSISTOR WITH MULTI-LAYER CHANNEL |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2883661A1 FR2883661A1 (en) | 2006-09-29 |
FR2883661B1 true FR2883661B1 (en) | 2008-04-25 |
Family
ID=36956234
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR0603975A Expired - Fee Related FR2883661B1 (en) | 2006-05-04 | 2006-05-04 | MULTI-LAYER CHANNEL FIELD EFFECT TRANSISTOR WITH MULTI-LAYER CHANNEL |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR2883661B1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8817358B2 (en) * | 2012-08-02 | 2014-08-26 | Qualcomm Mems Technologies, Inc. | Thin film stack with surface-conditioning buffer layers and related methods |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5461250A (en) * | 1992-08-10 | 1995-10-24 | International Business Machines Corporation | SiGe thin film or SOI MOSFET and method for making the same |
US6326667B1 (en) * | 1999-09-09 | 2001-12-04 | Kabushiki Kaisha Toshiba | Semiconductor devices and methods for producing semiconductor devices |
FR2799305B1 (en) * | 1999-10-05 | 2004-06-18 | St Microelectronics Sa | METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE WITH ENVELOPING GRID AND DEVICE OBTAINED |
JP3782021B2 (en) * | 2002-02-22 | 2006-06-07 | 株式会社東芝 | Semiconductor device, semiconductor device manufacturing method, and semiconductor substrate manufacturing method |
FR2842350B1 (en) * | 2002-07-09 | 2005-05-13 | METHOD FOR TRANSFERRING A LAYER OF CONCEALED SEMICONDUCTOR MATERIAL |
-
2006
- 2006-05-04 FR FR0603975A patent/FR2883661B1/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
FR2883661A1 (en) | 2006-09-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
CD | Change of name or company name |
Effective date: 20120423 Owner name: SOITEC, FR |
|
ST | Notification of lapse |
Effective date: 20131031 |