FR2822968B1 - CHASSIS OF EXPOSURE TO THE LIGHT OF A PRINTED CIRCUIT - Google Patents
CHASSIS OF EXPOSURE TO THE LIGHT OF A PRINTED CIRCUITInfo
- Publication number
- FR2822968B1 FR2822968B1 FR0104188A FR0104188A FR2822968B1 FR 2822968 B1 FR2822968 B1 FR 2822968B1 FR 0104188 A FR0104188 A FR 0104188A FR 0104188 A FR0104188 A FR 0104188A FR 2822968 B1 FR2822968 B1 FR 2822968B1
- Authority
- FR
- France
- Prior art keywords
- chassis
- exposure
- light
- printed circuit
- printed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
- G03F7/2032—Simultaneous exposure of the front side and the backside
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/15—Position of the PCB during processing
- H05K2203/1572—Processing both sides of a PCB by the same process; Providing a similar arrangement of components on both sides; Making interlayer connections from two sides
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0104188A FR2822968B1 (en) | 2001-03-28 | 2001-03-28 | CHASSIS OF EXPOSURE TO THE LIGHT OF A PRINTED CIRCUIT |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0104188A FR2822968B1 (en) | 2001-03-28 | 2001-03-28 | CHASSIS OF EXPOSURE TO THE LIGHT OF A PRINTED CIRCUIT |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2822968A1 FR2822968A1 (en) | 2002-10-04 |
FR2822968B1 true FR2822968B1 (en) | 2003-08-15 |
Family
ID=8861643
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR0104188A Expired - Fee Related FR2822968B1 (en) | 2001-03-28 | 2001-03-28 | CHASSIS OF EXPOSURE TO THE LIGHT OF A PRINTED CIRCUIT |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR2822968B1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102009052270A1 (en) * | 2009-11-09 | 2011-05-12 | Oguntke, Astrid | Exposure device and method for exposure of substrates |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4448522A (en) * | 1982-10-22 | 1984-05-15 | Rca Corporation | Device for supporting and aligning photographic masters |
US4676633A (en) * | 1986-06-06 | 1987-06-30 | Burgess Industries Inc. | Progressive directional evacuation of vacuum copy frames |
JPH07168366A (en) * | 1993-08-26 | 1995-07-04 | Adtec Eng:Kk | Exposure device |
-
2001
- 2001-03-28 FR FR0104188A patent/FR2822968B1/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
FR2822968A1 (en) | 2002-10-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
GC | Lien (pledge) constituted | ||
ST | Notification of lapse |
Effective date: 20081125 |