FR2816519B1 - Dispositif d'injection de gaz dans un reacteur a chauffage par lampes a rayonnement electromagnetique, et four de traitement equipe d'un tel dispositif - Google Patents

Dispositif d'injection de gaz dans un reacteur a chauffage par lampes a rayonnement electromagnetique, et four de traitement equipe d'un tel dispositif

Info

Publication number
FR2816519B1
FR2816519B1 FR0014725A FR0014725A FR2816519B1 FR 2816519 B1 FR2816519 B1 FR 2816519B1 FR 0014725 A FR0014725 A FR 0014725A FR 0014725 A FR0014725 A FR 0014725A FR 2816519 B1 FR2816519 B1 FR 2816519B1
Authority
FR
France
Prior art keywords
electromagnetic radiation
gas injection
radiation lamp
lamp heating
oven provided
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0014725A
Other languages
English (en)
Other versions
FR2816519A1 (fr
Inventor
Franck Laporte
Rene Pierre Ducret
Benoit Pierret
Herve Guillon
Bachir Semmache
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Joint Industrial Processors for Electronics
Original Assignee
Joint Industrial Processors for Electronics
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Joint Industrial Processors for Electronics filed Critical Joint Industrial Processors for Electronics
Priority to FR0014725A priority Critical patent/FR2816519B1/fr
Priority to PCT/FR2001/003536 priority patent/WO2002040741A1/fr
Priority to AU2002220780A priority patent/AU2002220780A1/en
Publication of FR2816519A1 publication Critical patent/FR2816519A1/fr
Application granted granted Critical
Publication of FR2816519B1 publication Critical patent/FR2816519B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/4557—Heated nozzles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45572—Cooled nozzles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/4558—Perforated rings
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation by radiant heating of the substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67115—Apparatus for thermal treatment mainly by radiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical Vapour Deposition (AREA)
FR0014725A 2000-11-15 2000-11-15 Dispositif d'injection de gaz dans un reacteur a chauffage par lampes a rayonnement electromagnetique, et four de traitement equipe d'un tel dispositif Expired - Fee Related FR2816519B1 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
FR0014725A FR2816519B1 (fr) 2000-11-15 2000-11-15 Dispositif d'injection de gaz dans un reacteur a chauffage par lampes a rayonnement electromagnetique, et four de traitement equipe d'un tel dispositif
PCT/FR2001/003536 WO2002040741A1 (fr) 2000-11-15 2001-11-13 Dispositif d'injection de gaz et four de traitement equipe d'un tel dispositif
AU2002220780A AU2002220780A1 (en) 2000-11-15 2001-11-13 Gas injection device and treatment furnace equipped with same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0014725A FR2816519B1 (fr) 2000-11-15 2000-11-15 Dispositif d'injection de gaz dans un reacteur a chauffage par lampes a rayonnement electromagnetique, et four de traitement equipe d'un tel dispositif

Publications (2)

Publication Number Publication Date
FR2816519A1 FR2816519A1 (fr) 2002-05-17
FR2816519B1 true FR2816519B1 (fr) 2003-02-14

Family

ID=8856491

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0014725A Expired - Fee Related FR2816519B1 (fr) 2000-11-15 2000-11-15 Dispositif d'injection de gaz dans un reacteur a chauffage par lampes a rayonnement electromagnetique, et four de traitement equipe d'un tel dispositif

Country Status (3)

Country Link
AU (1) AU2002220780A1 (fr)
FR (1) FR2816519B1 (fr)
WO (1) WO2002040741A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7387811B2 (en) 2004-09-21 2008-06-17 Superpower, Inc. Method for manufacturing high temperature superconducting conductors using chemical vapor deposition (CVD)
DE102016108845A1 (de) * 2016-05-12 2017-11-16 Stephan Wege Gasinjektor für Reaktorbereiche

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01161719A (ja) * 1987-12-18 1989-06-26 Fujitsu Ltd 気相成長装置
TW356554B (en) * 1995-10-23 1999-04-21 Watkins Johnson Co Gas injection system for semiconductor processing
EP1063690A4 (fr) * 1998-03-05 2003-03-26 Tokyo Electron Ltd Appareil et procede de traitement au plasma

Also Published As

Publication number Publication date
WO2002040741A1 (fr) 2002-05-23
FR2816519A1 (fr) 2002-05-17
AU2002220780A1 (en) 2002-05-27

Similar Documents

Publication Publication Date Title
EP1250028A4 (fr) Plaque de cuisson a induction
FR2827114B1 (fr) Dispositif lumineux en ligne et appareil de cuisson a chauffage par induction utilisant celui-ci
DE69504442D1 (de) Kombinierter Gas- und Mikrowellenkochherd mit Vorrichtung zum Kochen mit Dampf
ITMI920031A1 (it) Bruciatore perfezionato per fornelli di cottura a gas a tre fiamme concentriche
FR2815395B1 (fr) Dispositif de chauffage rapide et uniforme d'un substrat par rayonnement infrarouge
CA2349132A1 (fr) Appareil de chauffage avec lampe
FR2817019B1 (fr) Hublot pour four de cuisson, pourvu d'un dispositif de chauffage additionnel
ZA918171B (en) Process for heating a thermic enclosure,and burner
TR26128A (tr) Yakit yakici aygit ve bir firin icinde kullanim yöntemi
FR2816519B1 (fr) Dispositif d'injection de gaz dans un reacteur a chauffage par lampes a rayonnement electromagnetique, et four de traitement equipe d'un tel dispositif
TR26394A (tr) PISIRME YAKITI KONTEYNERI VE BRüLÖRü
IT1281854B1 (it) Bruciatori a gas per piani di cottura in vetroceramico e per riscaldamento
GB2276442A8 (en) Heating device burning gaseous fuel
FR2816520B1 (fr) Dispositif d'injection multi-zones dans un reacteur rtp ou cvd a chauffage par lampes a rayonnement electromagnetique
DE69518939T2 (de) Kochmulde mit positionierbarem Gasbrenner
ES2159456A1 (es) Protector para encimeras de cocina.
FR2818499B1 (fr) Four de chauffage a induction electromagnetique, et barquette pour un dispositif distributeur de plateaux-repas utilisant le four
FR2751053B1 (fr) Dispositif a combustion de gaz pour le chauffage de tubes
KR950014994U (ko) 텐트 난방용 히터 및 난로기능을 겸한 휴대용 가스버너
GB0010209D0 (en) Firebox divider and cooking/heating apparatus with firebox divider
FR2679011B1 (fr) Panneau a elements radiants de chauffage au gaz.
Piechurowski et al. RESULTS OF USING A GLASS TANK WHICH IS HEATED BOTH BY FLAME AND BY ELECTRICITY
SE9403403L (sv) Portabel spis
EP0389463A3 (fr) Four pour traitement thermique
TR25576A (tr) Ocaklardaki gaz memeleri icin alev yayicisi.

Legal Events

Date Code Title Description
ST Notification of lapse

Effective date: 20140731