FR2769922B1 - OBTAINING TI (O, N) LAYERS OF ADJUSTABLE STOECHIOMETRY BY MOCVD - Google Patents

OBTAINING TI (O, N) LAYERS OF ADJUSTABLE STOECHIOMETRY BY MOCVD

Info

Publication number
FR2769922B1
FR2769922B1 FR9713043A FR9713043A FR2769922B1 FR 2769922 B1 FR2769922 B1 FR 2769922B1 FR 9713043 A FR9713043 A FR 9713043A FR 9713043 A FR9713043 A FR 9713043A FR 2769922 B1 FR2769922 B1 FR 2769922B1
Authority
FR
France
Prior art keywords
stoechiometry
mocvd
adjustable
layers
obtaining
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9713043A
Other languages
French (fr)
Other versions
FR2769922A1 (en
Inventor
Paul Jacques Silillot
Philippe Bebelon
Marco Sacilotti
Sylvie Bourgeois
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Universite de Bourgogne
Original Assignee
Universite de Bourgogne
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Universite de Bourgogne filed Critical Universite de Bourgogne
Priority to FR9713043A priority Critical patent/FR2769922B1/en
Publication of FR2769922A1 publication Critical patent/FR2769922A1/en
Application granted granted Critical
Publication of FR2769922B1 publication Critical patent/FR2769922B1/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/405—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/308—Oxynitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
FR9713043A 1997-10-17 1997-10-17 OBTAINING TI (O, N) LAYERS OF ADJUSTABLE STOECHIOMETRY BY MOCVD Expired - Fee Related FR2769922B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR9713043A FR2769922B1 (en) 1997-10-17 1997-10-17 OBTAINING TI (O, N) LAYERS OF ADJUSTABLE STOECHIOMETRY BY MOCVD

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9713043A FR2769922B1 (en) 1997-10-17 1997-10-17 OBTAINING TI (O, N) LAYERS OF ADJUSTABLE STOECHIOMETRY BY MOCVD

Publications (2)

Publication Number Publication Date
FR2769922A1 FR2769922A1 (en) 1999-04-23
FR2769922B1 true FR2769922B1 (en) 1999-12-03

Family

ID=9512374

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9713043A Expired - Fee Related FR2769922B1 (en) 1997-10-17 1997-10-17 OBTAINING TI (O, N) LAYERS OF ADJUSTABLE STOECHIOMETRY BY MOCVD

Country Status (1)

Country Link
FR (1) FR2769922B1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10017909B4 (en) * 1999-04-13 2009-07-23 Mitsubishi Materials Corp. Coated cemented carbide cutting tool element
EP1152066A1 (en) * 2000-05-05 2001-11-07 Ingersoll-Rand Company Coloured metal nitride films and process of manufacturing
US7431903B2 (en) 2001-10-30 2008-10-07 Catalysts & Chemicals Industries Co., Ltd. Tubular titanium oxide particles and process for preparing same

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3512825A1 (en) * 1985-04-10 1986-10-16 Stiftung Institut für Härterei-Technik, 2820 Bremen METHOD FOR THE PRODUCTION OF WEAR-RESISTANT COMPOSITES
DE19506579C2 (en) * 1995-02-24 1996-12-12 Fraunhofer Ges Forschung Process for the production of TiN layers and the layer produced by this process

Also Published As

Publication number Publication date
FR2769922A1 (en) 1999-04-23

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Legal Events

Date Code Title Description
ST Notification of lapse

Effective date: 20080630