FR2677841B1 - REACTOR FOR GAS PHASE PLASMA DEPOSITION OF INORGANIC COMPOUNDS ON A POLYMERIC SUBSTRATE. - Google Patents

REACTOR FOR GAS PHASE PLASMA DEPOSITION OF INORGANIC COMPOUNDS ON A POLYMERIC SUBSTRATE.

Info

Publication number
FR2677841B1
FR2677841B1 FR9107138A FR9107138A FR2677841B1 FR 2677841 B1 FR2677841 B1 FR 2677841B1 FR 9107138 A FR9107138 A FR 9107138A FR 9107138 A FR9107138 A FR 9107138A FR 2677841 B1 FR2677841 B1 FR 2677841B1
Authority
FR
France
Prior art keywords
reactor
gas phase
inorganic compounds
polymeric substrate
plasma deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9107138A
Other languages
French (fr)
Other versions
FR2677841A1 (en
Inventor
Jean-Christophe Rostaing
Francois Coeuret
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Air Liquide SA
Original Assignee
Air Liquide SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Liquide SA filed Critical Air Liquide SA
Priority to FR9107138A priority Critical patent/FR2677841B1/en
Priority to JP4151668A priority patent/JPH05331648A/en
Publication of FR2677841A1 publication Critical patent/FR2677841A1/en
Application granted granted Critical
Publication of FR2677841B1 publication Critical patent/FR2677841B1/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357—Generation remote from the workpiece, e.g. down-stream
FR9107138A 1991-06-12 1991-06-12 REACTOR FOR GAS PHASE PLASMA DEPOSITION OF INORGANIC COMPOUNDS ON A POLYMERIC SUBSTRATE. Expired - Fee Related FR2677841B1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
FR9107138A FR2677841B1 (en) 1991-06-12 1991-06-12 REACTOR FOR GAS PHASE PLASMA DEPOSITION OF INORGANIC COMPOUNDS ON A POLYMERIC SUBSTRATE.
JP4151668A JPH05331648A (en) 1991-06-12 1992-06-11 Reactor for plasma deposition of inorganic compound in gas phase on polymer substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9107138A FR2677841B1 (en) 1991-06-12 1991-06-12 REACTOR FOR GAS PHASE PLASMA DEPOSITION OF INORGANIC COMPOUNDS ON A POLYMERIC SUBSTRATE.

Publications (2)

Publication Number Publication Date
FR2677841A1 FR2677841A1 (en) 1992-12-18
FR2677841B1 true FR2677841B1 (en) 1997-01-10

Family

ID=9413732

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9107138A Expired - Fee Related FR2677841B1 (en) 1991-06-12 1991-06-12 REACTOR FOR GAS PHASE PLASMA DEPOSITION OF INORGANIC COMPOUNDS ON A POLYMERIC SUBSTRATE.

Country Status (2)

Country Link
JP (1) JPH05331648A (en)
FR (1) FR2677841B1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102388680A (en) * 2009-02-05 2012-03-21 苏舍美特科公司 Plasma coating system and method for coating or treating the surface of a substrate

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5620523A (en) * 1994-04-11 1997-04-15 Canon Sales Co., Inc. Apparatus for forming film
FR2766321B1 (en) * 1997-07-16 1999-09-03 Air Liquide SURFACE WAVE PLASMA GAS EXCITATION DEVICE
DE19943064B4 (en) * 1999-09-09 2013-01-31 Robert Bosch Gmbh A method of epitaxially depositing atoms or molecules from a reactive gas on a deposition surface of a substrate
US20150118855A1 (en) * 2013-10-30 2015-04-30 Nisene Technology Group Microwave induced plasma decapsulation

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2614317B1 (en) * 1987-04-22 1989-07-13 Air Liquide PROCESS FOR PROTECTING POLYMERIC SUBSTRATE BY PLASMA DEPOSITION OF COMPOUNDS OF THE SILICON OXYNITRIDE TYPE AND DEVICE FOR IMPLEMENTING SAME.
FR2616030A1 (en) * 1987-06-01 1988-12-02 Commissariat Energie Atomique PLASMA ETCHING OR DEPOSITION METHOD AND DEVICE FOR IMPLEMENTING THE METHOD
FR2653633B1 (en) * 1989-10-19 1991-12-20 Commissariat Energie Atomique CHEMICAL TREATMENT DEVICE ASSISTED BY A DIFFUSION PLASMA.

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102388680A (en) * 2009-02-05 2012-03-21 苏舍美特科公司 Plasma coating system and method for coating or treating the surface of a substrate
RU2536818C2 (en) * 2009-02-05 2014-12-27 Зульцер Метко Аг Coating plasma sprayer and method of coating application or that of substrate processing

Also Published As

Publication number Publication date
JPH05331648A (en) 1993-12-14
FR2677841A1 (en) 1992-12-18

Similar Documents

Publication Publication Date Title
EP0723601A4 (en) A method for chemical vapor deposition of titanium nitride films at low temperatures
FR2708924B1 (en) Method of depositing a layer of metallic nitride on a transparent substrate.
DE69205494T2 (en) Coating system for plasma chemical vapor deposition.
FR2698882B1 (en) Method for forming a protective coating on a substrate.
ZA928331B (en) Apparatus for depositing on a substrate by chemical vapour deposition.
ES2040161A1 (en) Binder enriched cvd and pvd coated cutting tool.
FR2614317B1 (en) PROCESS FOR PROTECTING POLYMERIC SUBSTRATE BY PLASMA DEPOSITION OF COMPOUNDS OF THE SILICON OXYNITRIDE TYPE AND DEVICE FOR IMPLEMENTING SAME.
GB9711080D0 (en) Film or coating deposition on a substrate
EP0659904A3 (en) Vaporized hydrogen silsesquioxane for depositing a coating.
CA2210599A1 (en) Process for depositing barrier film on three-dimensional articles
GB2106939B (en) Installation for the deposition of thin layers in the reactive vapour phase by plasma
FR2707671B1 (en) Method and device for introducing precursors into a chemical vapor deposition chamber.
FR2670693B1 (en) PROCESS FOR CLEANING THE SURFACE OF A SUBSTRATE BY PLASMA.
TW402166U (en) Device for deposition of thin layers on a substrate
FR2599558B1 (en) METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE, INCLUDING THE DEPOSITION IN VAPOR PHASE OF LAYERS ON A SUBSTRATE
EP0444253A3 (en) Apparatus for the deposition of thin layers on a substrate
EP0630989A3 (en) Method of plasma chemical vapor deposition of layer with improved interface.
FR2677841B1 (en) REACTOR FOR GAS PHASE PLASMA DEPOSITION OF INORGANIC COMPOUNDS ON A POLYMERIC SUBSTRATE.
FR2673633B1 (en) MULTILAYER COATING FOR POLYCARBONATE SUBSTRATE.
FI920733A (en) Apparatus for coating a substrate
EP0604075A3 (en) Production of a hard coated substrate.
AU8312091A (en) Chemical vapor deposition (cvd) process for plasma depositing silicon carbide films onto a substrate
FR2695410B1 (en) Process for pretreatment of a substrate for the selective deposition of tungsten.
FR2724853B1 (en) DEVICE FOR DISPENSING POWDERY SOLIDS ON THE SURFACE OF A SUBSTRATE FOR LAYING A COATING
AU8318191A (en) Chemical vapor deposition (cvd) process for thermally depositing silicone carbide films onto a substrate

Legal Events

Date Code Title Description
ST Notification of lapse