FR2606129B1 - IMPROVED QUARTZ TUBE FOR THE HEAT TREATMENT OF SEMICONDUCTOR WAFERS - Google Patents
IMPROVED QUARTZ TUBE FOR THE HEAT TREATMENT OF SEMICONDUCTOR WAFERSInfo
- Publication number
- FR2606129B1 FR2606129B1 FR8615431A FR8615431A FR2606129B1 FR 2606129 B1 FR2606129 B1 FR 2606129B1 FR 8615431 A FR8615431 A FR 8615431A FR 8615431 A FR8615431 A FR 8615431A FR 2606129 B1 FR2606129 B1 FR 2606129B1
- Authority
- FR
- France
- Prior art keywords
- heat treatment
- semiconductor wafers
- quartz tube
- improved quartz
- improved
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
- C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
- C30B31/10—Reaction chambers; Selection of materials therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR8615431A FR2606129B1 (en) | 1986-10-30 | 1986-10-30 | IMPROVED QUARTZ TUBE FOR THE HEAT TREATMENT OF SEMICONDUCTOR WAFERS |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR8615431A FR2606129B1 (en) | 1986-10-30 | 1986-10-30 | IMPROVED QUARTZ TUBE FOR THE HEAT TREATMENT OF SEMICONDUCTOR WAFERS |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2606129A1 FR2606129A1 (en) | 1988-05-06 |
FR2606129B1 true FR2606129B1 (en) | 1989-08-18 |
Family
ID=9340558
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR8615431A Expired FR2606129B1 (en) | 1986-10-30 | 1986-10-30 | IMPROVED QUARTZ TUBE FOR THE HEAT TREATMENT OF SEMICONDUCTOR WAFERS |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR2606129B1 (en) |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2409791A1 (en) * | 1977-11-25 | 1979-06-22 | Silicium Semiconducteur Ssc | Doping semiconductor wafers - by diffusion in a furnace-heated tube closed at the ends using an atmosphere of pressurised argon |
JPS5849290B2 (en) * | 1980-08-18 | 1983-11-02 | 富士通株式会社 | quartz reaction tube |
DE8605735U1 (en) * | 1986-03-03 | 1986-04-17 | Heraeus Quarzschmelze Gmbh, 6450 Hanau | Double wall quartz glass tube |
-
1986
- 1986-10-30 FR FR8615431A patent/FR2606129B1/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
FR2606129A1 (en) | 1988-05-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse | ||
ST | Notification of lapse |