FR2590405B1 - Procede de gravure de materiaux organiques par plasma - Google Patents

Procede de gravure de materiaux organiques par plasma

Info

Publication number
FR2590405B1
FR2590405B1 FR8517486A FR8517486A FR2590405B1 FR 2590405 B1 FR2590405 B1 FR 2590405B1 FR 8517486 A FR8517486 A FR 8517486A FR 8517486 A FR8517486 A FR 8517486A FR 2590405 B1 FR2590405 B1 FR 2590405B1
Authority
FR
France
Prior art keywords
organic material
engraving process
plasma organic
material engraving
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8517486A
Other languages
English (en)
Other versions
FR2590405A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to FR8517486A priority Critical patent/FR2590405B1/fr
Priority to DE8686420279T priority patent/DE3672783D1/de
Priority to EP19860420279 priority patent/EP0227561B1/fr
Publication of FR2590405A1 publication Critical patent/FR2590405A1/fr
Application granted granted Critical
Publication of FR2590405B1 publication Critical patent/FR2590405B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/36—Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/311—Etching the insulating layers by chemical or physical means
    • H01L21/31127—Etching organic layers
    • H01L21/31133—Etching organic layers by chemical means
    • H01L21/31138—Etching organic layers by chemical means by dry-etching

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Semiconductors (AREA)
FR8517486A 1985-11-21 1985-11-21 Procede de gravure de materiaux organiques par plasma Expired FR2590405B1 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
FR8517486A FR2590405B1 (fr) 1985-11-21 1985-11-21 Procede de gravure de materiaux organiques par plasma
DE8686420279T DE3672783D1 (de) 1985-11-21 1986-11-19 Verfahren zum plasmaaetzen von organischen materialien.
EP19860420279 EP0227561B1 (fr) 1985-11-21 1986-11-19 Procédé de gravure de matériaux organiques par plasma

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8517486A FR2590405B1 (fr) 1985-11-21 1985-11-21 Procede de gravure de materiaux organiques par plasma

Publications (2)

Publication Number Publication Date
FR2590405A1 FR2590405A1 (fr) 1987-05-22
FR2590405B1 true FR2590405B1 (fr) 1988-02-05

Family

ID=9325176

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8517486A Expired FR2590405B1 (fr) 1985-11-21 1985-11-21 Procede de gravure de materiaux organiques par plasma

Country Status (3)

Country Link
EP (1) EP0227561B1 (fr)
DE (1) DE3672783D1 (fr)
FR (1) FR2590405B1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0359221B1 (fr) * 1988-09-16 1996-05-15 Texas Instruments Incorporated Procédé pour traiter à haute pression au silicone des résines photosensibles et appareil
US5348619A (en) * 1992-09-03 1994-09-20 Texas Instruments Incorporated Metal selective polymer removal

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4407850A (en) * 1982-01-11 1983-10-04 The Perkin-Elmer Corporation Profile control photoresist

Also Published As

Publication number Publication date
EP0227561B1 (fr) 1990-07-18
DE3672783D1 (de) 1990-08-23
FR2590405A1 (fr) 1987-05-22
EP0227561A1 (fr) 1987-07-01

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Legal Events

Date Code Title Description
ST Notification of lapse
TP Transmission of property