FR2578095B1 - METHOD AND DEVICE FOR THE EPITAXIAL GROWTH DEPOSITION OF A DOPED MATERIAL - Google Patents

METHOD AND DEVICE FOR THE EPITAXIAL GROWTH DEPOSITION OF A DOPED MATERIAL

Info

Publication number
FR2578095B1
FR2578095B1 FR8502976A FR8502976A FR2578095B1 FR 2578095 B1 FR2578095 B1 FR 2578095B1 FR 8502976 A FR8502976 A FR 8502976A FR 8502976 A FR8502976 A FR 8502976A FR 2578095 B1 FR2578095 B1 FR 2578095B1
Authority
FR
France
Prior art keywords
epitaxial growth
doped material
growth deposition
deposition
doped
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8502976A
Other languages
French (fr)
Other versions
FR2578095A1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AVITAYA FRANCOIS D
Original Assignee
AVITAYA FRANCOIS D
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AVITAYA FRANCOIS D filed Critical AVITAYA FRANCOIS D
Priority to FR8502976A priority Critical patent/FR2578095B1/en
Priority to PCT/FR1986/000048 priority patent/WO1986005319A1/en
Priority to JP61501223A priority patent/JPS62502086A/en
Priority to EP86901409A priority patent/EP0214207B1/en
Priority to DE8686901409T priority patent/DE3671571D1/en
Publication of FR2578095A1 publication Critical patent/FR2578095A1/en
Application granted granted Critical
Publication of FR2578095B1 publication Critical patent/FR2578095B1/en
Priority to US07/185,269 priority patent/US4847216A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02—Elements
    • C30B29/06—Silicon
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
    • C30B23/02—Epitaxial-layer growth
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02367—Substrates
    • H01L21/0237—Materials
    • H01L21/02373—Group 14 semiconducting materials
    • H01L21/02381—Silicon, silicon germanium, germanium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02367—Substrates
    • H01L21/0237—Materials
    • H01L21/02387—Group 13/15 materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02521—Materials
    • H01L21/02524—Group 14 semiconducting materials
    • H01L21/02532—Silicon, silicon germanium, germanium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02521—Materials
    • H01L21/02538—Group 13/15 materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/0257—Doping during depositing
    • H01L21/02573—Conductivity type
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10S117/905—Electron beam
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/002—Amphoteric doping
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/041—Doping control in crystal growth
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/046—Electron beam treatment of devices
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/169—Vacuum deposition, e.g. including molecular beam epitaxy

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
FR8502976A 1985-02-28 1985-02-28 METHOD AND DEVICE FOR THE EPITAXIAL GROWTH DEPOSITION OF A DOPED MATERIAL Expired FR2578095B1 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
FR8502976A FR2578095B1 (en) 1985-02-28 1985-02-28 METHOD AND DEVICE FOR THE EPITAXIAL GROWTH DEPOSITION OF A DOPED MATERIAL
PCT/FR1986/000048 WO1986005319A1 (en) 1985-02-28 1986-02-19 Method and device for depositing a doped material by epitaxial growth
JP61501223A JPS62502086A (en) 1985-02-28 1986-02-19 Method and apparatus for epitaxial deposition of doped materials
EP86901409A EP0214207B1 (en) 1985-02-28 1986-02-19 Method and device for depositing a doped material by epitaxial growth
DE8686901409T DE3671571D1 (en) 1985-02-28 1986-02-19 METHOD AND ARRANGEMENT FOR EPITAXIAL DEPOSITION OF A DOPED MATERIAL.
US07/185,269 US4847216A (en) 1985-02-28 1988-04-18 Process for the deposition by epitaxy of a doped material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8502976A FR2578095B1 (en) 1985-02-28 1985-02-28 METHOD AND DEVICE FOR THE EPITAXIAL GROWTH DEPOSITION OF A DOPED MATERIAL

Publications (2)

Publication Number Publication Date
FR2578095A1 FR2578095A1 (en) 1986-08-29
FR2578095B1 true FR2578095B1 (en) 1988-04-15

Family

ID=9316742

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8502976A Expired FR2578095B1 (en) 1985-02-28 1985-02-28 METHOD AND DEVICE FOR THE EPITAXIAL GROWTH DEPOSITION OF A DOPED MATERIAL

Country Status (6)

Country Link
US (1) US4847216A (en)
EP (1) EP0214207B1 (en)
JP (1) JPS62502086A (en)
DE (1) DE3671571D1 (en)
FR (1) FR2578095B1 (en)
WO (1) WO1986005319A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5250388A (en) * 1988-05-31 1993-10-05 Westinghouse Electric Corp. Production of highly conductive polymers for electronic circuits
US5563094A (en) * 1989-03-24 1996-10-08 Xerox Corporation Buried reverse bias junction configurations in semiconductor structures employing photo induced evaporation enhancement during in situ epitaxial growth and device structures utilizing the same
JPH02260417A (en) * 1989-03-30 1990-10-23 Mitsubishi Electric Corp Method and apparatus for crystal growth of semiconductor thin film
US5028561A (en) * 1989-06-15 1991-07-02 Hughes Aircraft Company Method of growing p-type group II-VI material
US5024967A (en) * 1989-06-30 1991-06-18 At&T Bell Laboratories Doping procedures for semiconductor devices
JPH0633231B2 (en) * 1990-01-12 1994-05-02 松下電器産業株式会社 Molecular beam epitaxial growth method

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1500701A (en) * 1974-01-24 1978-02-08 Atomic Energy Authority Uk Vapour deposition apparatus
JPS5814644B2 (en) * 1975-05-14 1983-03-22 松下電器産業株式会社 Hikaridensouronoseizouhouhou
US4203799A (en) * 1975-05-30 1980-05-20 Hitachi, Ltd. Method for monitoring thickness of epitaxial growth layer on substrate
JPS5372A (en) * 1976-06-24 1978-01-05 Agency Of Ind Science & Technol Selective doping crystal growing method
DE2812311C2 (en) * 1978-03-21 1986-10-09 Leybold-Heraeus GmbH, 5000 Köln Process for the simultaneous vacuum deposition of thin layers on several substrates by means of electron beams and application to the vapor deposition of turbine blades
US4234356A (en) * 1979-06-01 1980-11-18 Bell Telephone Laboratories, Incorporated Dual wavelength optical annealing of materials
US4239788A (en) * 1979-06-15 1980-12-16 Martin Marietta Corporation Method for the production of semiconductor devices using electron beam delineation
BR7908672A (en) * 1979-11-30 1981-06-30 Brasilia Telecom FILM POSITIONING PROCESS FROM THE STEAM PHASE
US4281030A (en) * 1980-05-12 1981-07-28 Bell Telephone Laboratories, Incorporated Implantation of vaporized material on melted substrates
US4411728A (en) * 1981-03-30 1983-10-25 Agency Of Industrial Science & Technology Method for manufacture of interdigital periodic structure device
US4392453A (en) * 1981-08-26 1983-07-12 Varian Associates, Inc. Molecular beam converters for vacuum coating systems
GB2130716A (en) * 1982-11-26 1984-06-06 Philips Electronic Associated Method of determining the composition of an alloy film grown by a layer-by layer process
JPS60225422A (en) * 1984-04-24 1985-11-09 Hitachi Ltd Forming method of thin film and equipment thereof

Also Published As

Publication number Publication date
WO1986005319A1 (en) 1986-09-12
US4847216A (en) 1989-07-11
EP0214207A1 (en) 1987-03-18
FR2578095A1 (en) 1986-08-29
EP0214207B1 (en) 1990-05-23
JPS62502086A (en) 1987-08-13
DE3671571D1 (en) 1990-06-28

Similar Documents

Publication Publication Date Title
FR2636288B1 (en) DEVICE AND METHOD FOR MAINTAINING THE STABILITY OF A VEHICLE
FR2573986B1 (en) TRANSLUMINAL IMPLANTATION DEVICE AND METHOD
FR2557245B1 (en) SEALING METHOD AND DEVICE FOR TREES
FR2581420B1 (en) METHOD AND DEVICE FOR COOLING TURBINE BLADES
FR2550661B1 (en) METHOD FOR EARTHING A SUPPORT FOR A PELLET AND DEVICE OBTAINED THEREBY
FR2585251B1 (en) PROCESS AND DEVICE FOR PURIFYING A HEMOFILTRAT
PT82966A (en) METHOD AND INSTALLATION FOR AIR DISTILLATION
FR2583579B1 (en) PROCESS FOR OBTAINING A PIEZOELECTRIC MATERIAL AND IMPLEMENTING DEVICE
FR2650806B1 (en) METHOD AND DEVICE FOR FEEDING BOTTLES
FR2578095B1 (en) METHOD AND DEVICE FOR THE EPITAXIAL GROWTH DEPOSITION OF A DOPED MATERIAL
FR2570223B1 (en) PIEZOELECTRIC DEVICE AND METHOD FOR PRODUCING SUCH A DEVICE
FR2591937B1 (en) METHOD AND DEVICE FOR CONTROLLING EXTRUDERS
GB2168080B (en) Vapour deposition apparatus and epitaxial layer growth methods
JPS57175795A (en) Device and method for crystal growth
FR2561875B1 (en) DEVICE FOR BEARING FISH
FR2578058B1 (en) METHOD AND DEVICE FOR TRACKING A COMMUNICATION SATELLITE
IT1186614B (en) DEVICE FOR THE FEEDING AND CUTTING OF A TAPE OF LABELS
FR2580199B1 (en) METHOD AND DEVICE FOR ADJUSTING THE WIDTH OF A LIQUID CURTAIN
FR2594434B1 (en) DEVICE AND METHOD FOR PRODUCING HUMUS BY LOMBRICOMPOSTAGE
GB2181747B (en) A molecular beam epitaxial growth apparatus
DE3665658D1 (en) Plant growth promotion
GB8727736D0 (en) Plant growth regulator device
FR2587925B1 (en) METHOD AND MACHINE FOR MOUNTING DRIPPER ON IRRIGATION TUBES
IT8412444A1 (en) Method and device for feeding continuous casting plants
FR2587805B1 (en) METHOD AND DEVICE FOR DETERMINING THE CRYSTALLOGRAPHIC TEXTURE OF A POLYCRYSTALLINE MATERIAL

Legal Events

Date Code Title Description
TP Transmission of property
ST Notification of lapse