FR2549496B1 - METHOD AND APPARATUS FOR CONTROLLING A SPRAY COATING - Google Patents

METHOD AND APPARATUS FOR CONTROLLING A SPRAY COATING

Info

Publication number
FR2549496B1
FR2549496B1 FR8411474A FR8411474A FR2549496B1 FR 2549496 B1 FR2549496 B1 FR 2549496B1 FR 8411474 A FR8411474 A FR 8411474A FR 8411474 A FR8411474 A FR 8411474A FR 2549496 B1 FR2549496 B1 FR 2549496B1
Authority
FR
France
Prior art keywords
controlling
spray coating
spray
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR8411474A
Other languages
French (fr)
Other versions
FR2549496A1 (en
Inventor
Donald Rex Boys
Robert M Smith
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Varian Medical Systems Inc
Original Assignee
Varian Associates Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Varian Associates Inc filed Critical Varian Associates Inc
Publication of FR2549496A1 publication Critical patent/FR2549496A1/en
Application granted granted Critical
Publication of FR2549496B1 publication Critical patent/FR2549496B1/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
FR8411474A 1983-07-19 1984-07-19 METHOD AND APPARATUS FOR CONTROLLING A SPRAY COATING Expired - Fee Related FR2549496B1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US51524683A 1983-07-19 1983-07-19

Publications (2)

Publication Number Publication Date
FR2549496A1 FR2549496A1 (en) 1985-01-25
FR2549496B1 true FR2549496B1 (en) 1991-03-29

Family

ID=24050558

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8411474A Expired - Fee Related FR2549496B1 (en) 1983-07-19 1984-07-19 METHOD AND APPARATUS FOR CONTROLLING A SPRAY COATING

Country Status (6)

Country Link
JP (1) JPS6039161A (en)
CA (1) CA1242989A (en)
DE (1) DE3425659A1 (en)
FR (1) FR2549496B1 (en)
GB (1) GB2144888B (en)
NL (1) NL8402163A (en)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3331406A1 (en) * 1983-08-31 1985-03-14 Leybold-Heraeus GmbH, 5000 Köln SPRAYING CATODE
US4595482A (en) * 1984-05-17 1986-06-17 Varian Associates, Inc. Apparatus for and the method of controlling magnetron sputter device having separate confining magnetic fields to separate targets subject to separate discharges
US4875810A (en) * 1985-10-21 1989-10-24 Canon Kabushiki Kaisha Apparatus for controlling fine particle flow
JPH0726204B2 (en) * 1986-04-16 1995-03-22 日本真空技術株式会社 Deposition control device by sputtering
DE3630737C1 (en) * 1986-09-10 1987-11-05 Philips & Du Pont Optical Cathode sputtering device with a device for measuring a critical target removal
JPS63125676A (en) * 1986-11-13 1988-05-28 Japan Aviation Electronics Ind Ltd Film formation by sputtering
CH669609A5 (en) * 1986-12-23 1989-03-31 Balzers Hochvakuum
JP2599395B2 (en) * 1987-07-29 1997-04-09 三菱プレシジョン株式会社 Tuned Dry Gyro
JPH01116071A (en) * 1987-10-28 1989-05-09 Tokyo Electron Ltd Sputtering device
DE10154229B4 (en) 2001-11-07 2004-08-05 Applied Films Gmbh & Co. Kg Device for the regulation of a plasma impedance
JP5850713B2 (en) * 2011-11-11 2016-02-03 株式会社アルバック Magnetron sputtering apparatus and magnetron sputtering method
CN104213089B (en) * 2014-08-22 2016-06-29 京东方科技集团股份有限公司 Magnetron sputtering apparatus and magnetically controlled sputter method
GB201714646D0 (en) * 2017-09-12 2017-10-25 Spts Technologies Ltd Saw device and method of manufacture
DE102020128802A1 (en) 2020-11-02 2022-05-05 VON ARDENNE Asset GmbH & Co. KG Method, control device and storage medium

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3956093A (en) * 1974-12-16 1976-05-11 Airco, Inc. Planar magnetron sputtering method and apparatus
FR2371009A1 (en) * 1976-11-15 1978-06-09 Commissariat Energie Atomique METHOD FOR CONTROL OF LAYER DEPOSIT BY REACTIVE SPRAYING AND IMPLEMENTATION DEVICE
US4166783A (en) * 1978-04-17 1979-09-04 Varian Associates, Inc. Deposition rate regulation by computer control of sputtering systems
US4299678A (en) * 1979-07-23 1981-11-10 Spin Physics, Inc. Magnetic target plate for use in magnetron sputtering of magnetic films
DE3047113A1 (en) * 1980-12-13 1982-07-29 Leybold-Heraeus GmbH, 5000 Köln Cathode arrangement and control method for cathode sputtering systems with a magnet system for increasing the sputtering rate
JPS583976A (en) * 1981-06-29 1983-01-10 Hitachi Ltd Method and device for formation of film by sputtering
US4401539A (en) * 1981-01-30 1983-08-30 Hitachi, Ltd. Sputtering cathode structure for sputtering apparatuses, method of controlling magnetic flux generated by said sputtering cathode structure, and method of forming films by use of said sputtering cathode structure
JPS5816068A (en) * 1981-07-22 1983-01-29 Hitachi Ltd Target electrode structure for planer magnetron system spattering device
JPS5887270A (en) * 1981-11-18 1983-05-25 Hitachi Ltd Structural body of sputtering target of planar magnetron type

Also Published As

Publication number Publication date
FR2549496A1 (en) 1985-01-25
GB2144888A (en) 1985-03-13
DE3425659A1 (en) 1985-01-31
NL8402163A (en) 1985-02-18
JPS6039161A (en) 1985-02-28
GB2144888B (en) 1986-11-12
GB8418029D0 (en) 1984-08-22
CA1242989A (en) 1988-10-11

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Legal Events

Date Code Title Description
ST Notification of lapse