FR2448223B1 - - Google Patents
Info
- Publication number
- FR2448223B1 FR2448223B1 FR8001972A FR8001972A FR2448223B1 FR 2448223 B1 FR2448223 B1 FR 2448223B1 FR 8001972 A FR8001972 A FR 8001972A FR 8001972 A FR8001972 A FR 8001972A FR 2448223 B1 FR2448223 B1 FR 2448223B1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5826—Treatment with charged particles
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH118279A CH636647A5 (de) | 1979-02-01 | 1979-02-01 | Vakuumbedampfungsanlage. |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2448223A1 FR2448223A1 (US06815460-20041109-C00097.png) | 1980-08-29 |
| FR2448223B1 true FR2448223B1 (US06815460-20041109-C00097.png) | 1983-11-25 |
Family
ID=4204413
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR8001972A Expired FR2448223B1 (US06815460-20041109-C00097.png) | 1979-02-01 | 1980-01-30 |
Country Status (5)
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57149734A (en) * | 1981-03-12 | 1982-09-16 | Anelva Corp | Plasma applying working device |
| US4362611A (en) * | 1981-07-27 | 1982-12-07 | International Business Machines Corporation | Quadrupole R.F. sputtering system having an anode/cathode shield and a floating target shield |
| DE3248121A1 (de) * | 1982-12-24 | 1984-06-28 | Leybold-Heraeus GmbH, 5000 Köln | Hochleistungs-katodenanordnung fuer die erzeugung von mehrfachschichten |
| US4511593A (en) * | 1983-01-17 | 1985-04-16 | Multi-Arc Vacuum Systems Inc. | Vapor deposition apparatus and method |
| DE3331707A1 (de) * | 1983-09-02 | 1985-03-21 | Leybold-Heraeus GmbH, 5000 Köln | Verfahren und vorrichtung zum reaktiven aufstaeuben von verbindungen von metallen und halbleitern |
| US4623441A (en) * | 1984-08-15 | 1986-11-18 | Advanced Plasma Systems Inc. | Paired electrodes for plasma chambers |
| US5003178A (en) * | 1988-11-14 | 1991-03-26 | Electron Vision Corporation | Large-area uniform electron source |
| DE10215040B4 (de) * | 2002-04-05 | 2019-02-21 | Leybold Optics Gmbh | Vorrichtung und Verfahren zum Be- und Entladen einer Vakuumkammer |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3437734A (en) * | 1966-06-21 | 1969-04-08 | Isofilm Intern | Apparatus and method for effecting the restructuring of materials |
| US3507248A (en) * | 1967-06-15 | 1970-04-21 | Ibm | Vacuum evaporation coating apparatus including means for precleaning substrates by ion bombardment |
| US3900585A (en) * | 1972-02-12 | 1975-08-19 | Agency Ind Science Techn | Method for control of ionization electrostatic plating |
| FR2265872B1 (US06815460-20041109-C00097.png) * | 1974-03-27 | 1977-10-14 | Anvar | |
| JPS5435920B2 (US06815460-20041109-C00097.png) * | 1974-06-10 | 1979-11-06 | ||
| US4038171A (en) * | 1976-03-31 | 1977-07-26 | Battelle Memorial Institute | Supported plasma sputtering apparatus for high deposition rate over large area |
-
1979
- 1979-02-01 CH CH118279A patent/CH636647A5/de not_active IP Right Cessation
-
1980
- 1980-01-08 DE DE19803000451 patent/DE3000451A1/de active Granted
- 1980-01-28 US US06/115,729 patent/US4279216A/en not_active Expired - Lifetime
- 1980-01-29 GB GB8002891A patent/GB2040317B/en not_active Expired
- 1980-01-30 FR FR8001972A patent/FR2448223B1/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| FR2448223A1 (US06815460-20041109-C00097.png) | 1980-08-29 |
| GB2040317A (en) | 1980-08-28 |
| DE3000451A1 (de) | 1980-08-14 |
| CH636647A5 (de) | 1983-06-15 |
| US4279216A (en) | 1981-07-21 |
| DE3000451C2 (US06815460-20041109-C00097.png) | 1987-09-24 |
| GB2040317B (en) | 1982-11-17 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |