FR2385778A1 - PHOTOPOLYMERISABLE COATING COMPOSITIONS - Google Patents

PHOTOPOLYMERISABLE COATING COMPOSITIONS

Info

Publication number
FR2385778A1
FR2385778A1 FR7809106A FR7809106A FR2385778A1 FR 2385778 A1 FR2385778 A1 FR 2385778A1 FR 7809106 A FR7809106 A FR 7809106A FR 7809106 A FR7809106 A FR 7809106A FR 2385778 A1 FR2385778 A1 FR 2385778A1
Authority
FR
France
Prior art keywords
acid groups
weight
coating compositions
photopolymerizable
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7809106A
Other languages
French (fr)
Other versions
FR2385778B1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bayer AG
Original Assignee
Bayer AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bayer AG filed Critical Bayer AG
Publication of FR2385778A1 publication Critical patent/FR2385778A1/en
Application granted granted Critical
Publication of FR2385778B1 publication Critical patent/FR2385778B1/fr
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Paints Or Removers (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

L'invention concerne des compositions de revêtement photopolymérisables. Ces compositions sont constituées de : A. 70 à 99 % en poids d'au moins un composé photopolymérisable comportant une double liaison carbone-carbone à insaturation oléfinique photopolymérisable, B. 1 à 30 % en poids d'au moins une résine aminoplaste, et C. 0,1 à 20 % en poids par rapport à la somme des composants A + B d'au moins deux photo-amorceurs dont au moins l'un contient un ou plusieurs groupes acides dans sa molécule, ces groupes acides formant des acides lors de la photopolymérisation, et au moins l'un ne comporte pas de tels groupes acides. L'invention s'applique en particulier à des compositions formant par photopolymérisation des revêtements adhérant bien aux substrats, en particulier aux métaux, et possédant une bonne résistance aux solvants.The present invention relates to photopolymerizable coating compositions. These compositions consist of: A. 70 to 99% by weight of at least one photopolymerizable compound comprising a photopolymerizable olefinically unsaturated carbon-carbon double bond, B. 1 to 30% by weight of at least one aminoplast resin, and C. 0.1 to 20% by weight relative to the sum of components A + B of at least two photoinitiators of which at least one contains one or more acid groups in its molecule, these acid groups forming acids during photopolymerization, and at least one does not contain such acid groups. The invention applies in particular to compositions forming, by photopolymerization, coatings which adhere well to substrates, in particular to metals, and which have good resistance to solvents.

FR7809106A 1977-03-29 1978-03-29 PHOTOPOLYMERISABLE COATING COMPOSITIONS Granted FR2385778A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2713797A DE2713797C3 (en) 1977-03-29 1977-03-29 Photopolymerizable coating agents

Publications (2)

Publication Number Publication Date
FR2385778A1 true FR2385778A1 (en) 1978-10-27
FR2385778B1 FR2385778B1 (en) 1983-09-23

Family

ID=6004974

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7809106A Granted FR2385778A1 (en) 1977-03-29 1978-03-29 PHOTOPOLYMERISABLE COATING COMPOSITIONS

Country Status (9)

Country Link
JP (1) JPS53121831A (en)
AT (1) AT356781B (en)
DE (1) DE2713797C3 (en)
ES (1) ES468294A1 (en)
FR (1) FR2385778A1 (en)
GB (1) GB1587349A (en)
IT (1) IT7848618A0 (en)
NL (1) NL7803324A (en)
SE (1) SE425402C (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2120263B (en) * 1982-05-17 1985-07-31 Ciba Geigy Ag A process for curing acid-curable abrasive compositions
JPH03121154A (en) * 1989-10-03 1991-05-23 Asahi Chem Res Lab Ltd Photosensitive thermoset resin composition and method for forming solder resist pattern therewith
DE19709560C1 (en) 1997-03-07 1998-05-07 Herberts Gmbh Clearcoat paint composition for wet-in-wet application before stoving
DE19748153A1 (en) * 1997-10-31 1999-05-06 Stockhausen Chem Fab Gmbh Process for the production of cationic polyelectrolytes

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1919678A1 (en) * 1969-04-18 1970-11-05 Bayer Ag Alpha-methylol-benzoin-sulfonic acid ester
DE2610437A1 (en) * 1975-03-13 1976-09-16 Continental Can Co Photopolymerisable unsatd. ester mixture - with good adhesion to metal substrates contains acrylic polymer as adhesion promoter
DE2613098A1 (en) * 1975-03-26 1976-10-14 Sumitomo Chemical Co RADIATION AND HEAT CURABLE MOLDINGS ON THE BASIS OF UNSATURED POLYESTER

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1919678A1 (en) * 1969-04-18 1970-11-05 Bayer Ag Alpha-methylol-benzoin-sulfonic acid ester
DE2610437A1 (en) * 1975-03-13 1976-09-16 Continental Can Co Photopolymerisable unsatd. ester mixture - with good adhesion to metal substrates contains acrylic polymer as adhesion promoter
DE2613098A1 (en) * 1975-03-26 1976-10-14 Sumitomo Chemical Co RADIATION AND HEAT CURABLE MOLDINGS ON THE BASIS OF UNSATURED POLYESTER

Also Published As

Publication number Publication date
IT7848618A0 (en) 1978-03-28
AT356781B (en) 1980-05-27
JPS53121831A (en) 1978-10-24
ATA216778A (en) 1979-10-15
GB1587349A (en) 1981-04-01
SE7803474L (en) 1978-09-30
SE425402B (en) 1982-09-27
DE2713797C3 (en) 1982-04-01
SE425402C (en) 1984-05-08
ES468294A1 (en) 1978-11-16
DE2713797A1 (en) 1978-10-19
NL7803324A (en) 1978-10-03
FR2385778B1 (en) 1983-09-23
DE2713797B2 (en) 1981-06-25

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Legal Events

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