FR2350628B1 - - Google Patents

Info

Publication number
FR2350628B1
FR2350628B1 FR7713226A FR7713226A FR2350628B1 FR 2350628 B1 FR2350628 B1 FR 2350628B1 FR 7713226 A FR7713226 A FR 7713226A FR 7713226 A FR7713226 A FR 7713226A FR 2350628 B1 FR2350628 B1 FR 2350628B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7713226A
Other languages
French (fr)
Other versions
FR2350628A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Raytheon Co
Original Assignee
Hughes Aircraft Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hughes Aircraft Co filed Critical Hughes Aircraft Co
Publication of FR2350628A1 publication Critical patent/FR2350628A1/fr
Application granted granted Critical
Publication of FR2350628B1 publication Critical patent/FR2350628B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
FR7713226A 1976-05-03 1977-05-02 Procede d'alignement d'un cache a l'aide de reperes Granted FR2350628A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/682,432 US4085329A (en) 1976-05-03 1976-05-03 Hard X-ray and fluorescent X-ray detection of alignment marks for precision mask alignment

Publications (2)

Publication Number Publication Date
FR2350628A1 FR2350628A1 (fr) 1977-12-02
FR2350628B1 true FR2350628B1 (index.php) 1984-06-22

Family

ID=24739672

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7713226A Granted FR2350628A1 (fr) 1976-05-03 1977-05-02 Procede d'alignement d'un cache a l'aide de reperes

Country Status (3)

Country Link
US (1) US4085329A (index.php)
FR (1) FR2350628A1 (index.php)
GB (1) GB1577054A (index.php)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2635275C2 (de) * 1976-08-05 1984-09-06 Siemens AG, 1000 Berlin und 8000 München Verfahren zur Justierung eines scheibenförmigen Substrates relativ zu einer Fotomaske in einem Röntgenstrahlbelichtungsgerät
DE2722958A1 (de) * 1977-05-20 1978-11-23 Siemens Ag Verfahren zur justierung einer halbleiterscheibe relativ zu einer bestrahlungsmaske bei der roentgenstrahl-fotolithografie
US4122335A (en) * 1977-06-17 1978-10-24 Hughes Aircraft Company Method and apparatus for mask to wafer gap control in X-ray lithography
JPS5731134A (en) * 1980-08-01 1982-02-19 Hitachi Ltd Drawing device by electron beam
DE3121666A1 (de) * 1981-05-30 1982-12-16 Ibm Deutschland Gmbh, 7000 Stuttgart Verfahren und einrichtung zur gegenseitigen ausrichtung von objekten bei roentgenstrahl- und korpuskularstrahl-belichtungsvorgaengen
US4534047A (en) * 1984-01-06 1985-08-06 The Perkin-Elmer Corporation Mask ring assembly for X-ray lithography
US4610020A (en) * 1984-01-06 1986-09-02 The Perkin-Elmer Corporation X-ray mask ring and apparatus for making same
US4539695A (en) * 1984-01-06 1985-09-03 The Perkin-Elmer Corporation X-Ray lithography system
US4667109A (en) * 1984-03-09 1987-05-19 Canon Kabushiki Kaisha Alignment device
US4648106A (en) * 1984-11-21 1987-03-03 Micronix Corporation Gas control for X-ray lithographic system
JP3666951B2 (ja) 1995-10-06 2005-06-29 キヤノン株式会社 マーク検出方法、これを用いた位置合わせ方法、露光方法及び装置、ならびにデバイス生産方法
US5684593A (en) * 1996-04-25 1997-11-04 Hughes Electronics Easy to align interferometric reference reflectors
US6453002B1 (en) * 2000-04-18 2002-09-17 Jordan Valley Applied Radiation Ltd. Differential measurement of X-ray microfluorescence
JP2003007601A (ja) * 2001-06-26 2003-01-10 Canon Inc ２つの物体の間隔測定方法とそれを用いた半導体露光方法、および間隔測定装置、半導体露光装置
US7804934B2 (en) 2004-12-22 2010-09-28 Jordan Valley Semiconductors Ltd. Accurate measurement of layer dimensions using XRF
US8053279B2 (en) 2007-06-19 2011-11-08 Micron Technology, Inc. Methods and systems for imaging and cutting semiconductor wafers and other semiconductor workpieces
US9390984B2 (en) 2011-10-11 2016-07-12 Bruker Jv Israel Ltd. X-ray inspection of bumps on a semiconductor substrate
US9389192B2 (en) 2013-03-24 2016-07-12 Bruker Jv Israel Ltd. Estimation of XRF intensity from an array of micro-bumps
US9632043B2 (en) 2014-05-13 2017-04-25 Bruker Jv Israel Ltd. Method for accurately determining the thickness and/or elemental composition of small features on thin-substrates using micro-XRF
US9829448B2 (en) 2014-10-30 2017-11-28 Bruker Jv Israel Ltd. Measurement of small features using XRF

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3417243A (en) * 1965-10-28 1968-12-17 Minnesota Mining & Mfg Method and apparatus for x-ray fluorescence gauging of a higher atomic number selected element in a coating on a base
US3743842A (en) * 1972-01-14 1973-07-03 Massachusetts Inst Technology Soft x-ray lithographic apparatus and process
US3742229A (en) * 1972-06-29 1973-06-26 Massachusetts Inst Technology Soft x-ray mask alignment system
US3920984A (en) * 1974-04-08 1975-11-18 Machlett Lab Inc X-ray energy analyzer

Also Published As

Publication number Publication date
GB1577054A (en) 1980-10-15
FR2350628A1 (fr) 1977-12-02
US4085329A (en) 1978-04-18

Similar Documents

Publication Publication Date Title
FR2350628B1 (index.php)
JPS5412653B2 (index.php)
JPS52112640U (index.php)
FR2360916B1 (index.php)
JPS5432278Y2 (index.php)
JPS5343073U (index.php)
JPS5639082Y2 (index.php)
JPS5356004U (index.php)
JPS52171949U (index.php)
JPS52138319U (index.php)
JPS52126540U (index.php)
JPS5370045U (index.php)
JPS5395176U (index.php)
CS175347B1 (index.php)
CS180533B1 (index.php)
CH605241A5 (index.php)
CH612890A5 (index.php)
DD126792A1 (index.php)
DD126317A1 (index.php)
DD126010A1 (index.php)
DD125826A1 (index.php)
DD125294A1 (index.php)
DD125248A1 (index.php)
DD124434A1 (index.php)
DD127084A1 (index.php)

Legal Events

Date Code Title Description
ST Notification of lapse