FR2339953B1 - - Google Patents

Info

Publication number
FR2339953B1
FR2339953B1 FR7603010A FR7603010A FR2339953B1 FR 2339953 B1 FR2339953 B1 FR 2339953B1 FR 7603010 A FR7603010 A FR 7603010A FR 7603010 A FR7603010 A FR 7603010A FR 2339953 B1 FR2339953 B1 FR 2339953B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7603010A
Other languages
French (fr)
Other versions
FR2339953A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bpifrance Financement SA
Original Assignee
Agence National de Valorisation de la Recherche ANVAR
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agence National de Valorisation de la Recherche ANVAR filed Critical Agence National de Valorisation de la Recherche ANVAR
Priority to FR7603010A priority Critical patent/FR2339953A1/fr
Publication of FR2339953A1 publication Critical patent/FR2339953A1/fr
Application granted granted Critical
Publication of FR2339953B1 publication Critical patent/FR2339953B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/3063—Electrolytic etching
    • H01L31/118—

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Weting (AREA)
FR7603010A 1976-01-29 1976-01-29 Procede d'obtention de films minces en silicium de type n, de diodes a barriere de surface comportant de tels films, et detecteurs de particules comportant de telles diodes Granted FR2339953A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7603010A FR2339953A1 (fr) 1976-01-29 1976-01-29 Procede d'obtention de films minces en silicium de type n, de diodes a barriere de surface comportant de tels films, et detecteurs de particules comportant de telles diodes

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7603010A FR2339953A1 (fr) 1976-01-29 1976-01-29 Procede d'obtention de films minces en silicium de type n, de diodes a barriere de surface comportant de tels films, et detecteurs de particules comportant de telles diodes

Publications (2)

Publication Number Publication Date
FR2339953A1 FR2339953A1 (fr) 1977-08-26
FR2339953B1 true FR2339953B1 (id) 1979-07-20

Family

ID=9168723

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7603010A Granted FR2339953A1 (fr) 1976-01-29 1976-01-29 Procede d'obtention de films minces en silicium de type n, de diodes a barriere de surface comportant de tels films, et detecteurs de particules comportant de telles diodes

Country Status (1)

Country Link
FR (1) FR2339953A1 (id)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0296348B1 (de) * 1987-05-27 1993-03-31 Siemens Aktiengesellschaft Ätzverfahren zum Erzeugen von Lochöffnungen oder Gräben in n-dotiertem Silizium
DE4202454C1 (id) * 1992-01-29 1993-07-29 Siemens Ag, 8000 Muenchen, De

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2244259A1 (en) * 1973-09-14 1975-04-11 Siffert Method of forming particle detectors - uses two rings to isolate substrate region during etching

Also Published As

Publication number Publication date
FR2339953A1 (fr) 1977-08-26

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Legal Events

Date Code Title Description
ST Notification of lapse