FR2325018B1 - - Google Patents

Info

Publication number
FR2325018B1
FR2325018B1 FR7611975A FR7611975A FR2325018B1 FR 2325018 B1 FR2325018 B1 FR 2325018B1 FR 7611975 A FR7611975 A FR 7611975A FR 7611975 A FR7611975 A FR 7611975A FR 2325018 B1 FR2325018 B1 FR 2325018B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7611975A
Other languages
French (fr)
Other versions
FR2325018A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19752527908 external-priority patent/DE2527908C2/de
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2325018A1 publication Critical patent/FR2325018A1/fr
Application granted granted Critical
Publication of FR2325018B1 publication Critical patent/FR2325018B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/14—Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
FR7611975A 1975-06-23 1976-04-16 Dispositif de mesure d'intervalle pour definir la distance entre deux faces ou plus Granted FR2325018A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19752527908 DE2527908C2 (de) 1975-06-23 Vorrichtung zur automatischen Messung des Abstandes zwischen benachbarten Flächen zweier oder mehrerer Objekte

Publications (2)

Publication Number Publication Date
FR2325018A1 FR2325018A1 (fr) 1977-04-15
FR2325018B1 true FR2325018B1 (US06815460-20041109-C00097.png) 1979-04-20

Family

ID=5949734

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7611975A Granted FR2325018A1 (fr) 1975-06-23 1976-04-16 Dispositif de mesure d'intervalle pour definir la distance entre deux faces ou plus

Country Status (4)

Country Link
US (1) US4070116A (US06815460-20041109-C00097.png)
JP (1) JPS523455A (US06815460-20041109-C00097.png)
FR (1) FR2325018A1 (US06815460-20041109-C00097.png)
GB (1) GB1490049A (US06815460-20041109-C00097.png)

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JPS589923B2 (ja) * 1976-07-20 1983-02-23 オリンパス光学工業株式会社 内視鏡における自動焦点装置
DE2708507A1 (de) * 1977-02-26 1978-08-31 Leitz Ernst Gmbh Bilduebertragungseinrichtung zur untersuchung von unzugaenglichen partien eines objektes
US4165178A (en) * 1978-06-29 1979-08-21 International Business Machines Corporation Gap measurement tool
US4204772A (en) * 1978-09-25 1980-05-27 Recognition Systems, Inc. Optical measuring system
US4540278A (en) * 1979-04-02 1985-09-10 Optimetrix Corporation Optical focusing system
US4383757A (en) * 1979-04-02 1983-05-17 Optimetrix Corporation Optical focusing system
US4615621A (en) * 1982-04-02 1986-10-07 Eaton Corporation Auto-focus alignment and measurement system and method
US4580900A (en) * 1982-04-02 1986-04-08 Eaton Corporation Auto focus alignment and measurement system and method
US4694160A (en) * 1986-01-29 1987-09-15 Mechanical Technology Incorporated Fiber optic extender apparatus in a position servo loop
US4701610A (en) * 1986-01-29 1987-10-20 Mechanical Technology Incorporated Fiber optic proximity sensors for narrow targets with reflectivity compensation
US4692611A (en) * 1986-01-29 1987-09-08 Mechanical Technology Incorporated Fiber optic proximity sensor with feedback servo imaging means
US4719341A (en) * 1986-10-01 1988-01-12 Mechanical Technology Incorporated Fiber optic displacement sensor with oscillating optical path length
US5017772A (en) * 1989-05-30 1991-05-21 Bei Electronics, Inc. Fiber optic probe sensor for measuring target displacement
US5457395A (en) * 1994-07-18 1995-10-10 Ford Motor Company System and apparatus for measuring gaps between non-parallel surfaces
US6873087B1 (en) 1999-10-29 2005-03-29 Board Of Regents, The University Of Texas System High precision orientation alignment and gap control stages for imprint lithography processes
US6369888B1 (en) 1999-11-17 2002-04-09 Applied Materials, Inc. Method and apparatus for article inspection including speckle reduction
SG142150A1 (en) * 2000-07-16 2008-05-28 Univ Texas High-resolution overlay alignment systems for imprint lithography
US6696220B2 (en) * 2000-10-12 2004-02-24 Board Of Regents, The University Of Texas System Template for room temperature, low pressure micro-and nano-imprint lithography
WO2002006902A2 (en) * 2000-07-17 2002-01-24 Board Of Regents, The University Of Texas System Method and system of automatic fluid dispensing for imprint lithography processes
JP2004505273A (ja) * 2000-08-01 2004-02-19 ボード・オブ・リージエンツ，ザ・ユニバーシテイ・オブ・テキサス・システム 転写リソグラフィのための透明テンプレートと基板の間のギャップおよび配向を高精度でセンシングするための方法
US8016277B2 (en) * 2000-08-21 2011-09-13 Board Of Regents, The University Of Texas System Flexure based macro motion translation stage
US20060005657A1 (en) * 2004-06-01 2006-01-12 Molecular Imprints, Inc. Method and system to control movement of a body for nano-scale manufacturing
US20050274219A1 (en) * 2004-06-01 2005-12-15 Molecular Imprints, Inc. Method and system to control movement of a body for nano-scale manufacturing
US6964793B2 (en) * 2002-05-16 2005-11-15 Board Of Regents, The University Of Texas System Method for fabricating nanoscale patterns in light curable compositions using an electric field
US6806969B2 (en) * 2001-10-19 2004-10-19 Agilent Technologies, Inc. Optical measurement for measuring a small space through a transparent surface
US7037639B2 (en) * 2002-05-01 2006-05-02 Molecular Imprints, Inc. Methods of manufacturing a lithography template
US20030235787A1 (en) * 2002-06-24 2003-12-25 Watts Michael P.C. Low viscosity high resolution patterning material
US6926929B2 (en) 2002-07-09 2005-08-09 Molecular Imprints, Inc. System and method for dispensing liquids
US7077992B2 (en) 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US6900881B2 (en) 2002-07-11 2005-05-31 Molecular Imprints, Inc. Step and repeat imprint lithography systems
US6932934B2 (en) 2002-07-11 2005-08-23 Molecular Imprints, Inc. Formation of discontinuous films during an imprint lithography process
US7019819B2 (en) 2002-11-13 2006-03-28 Molecular Imprints, Inc. Chucking system for modulating shapes of substrates
US6908861B2 (en) 2002-07-11 2005-06-21 Molecular Imprints, Inc. Method for imprint lithography using an electric field
US7070405B2 (en) * 2002-08-01 2006-07-04 Molecular Imprints, Inc. Alignment systems for imprint lithography
US6916584B2 (en) 2002-08-01 2005-07-12 Molecular Imprints, Inc. Alignment methods for imprint lithography
US7027156B2 (en) 2002-08-01 2006-04-11 Molecular Imprints, Inc. Scatterometry alignment for imprint lithography
US7071088B2 (en) * 2002-08-23 2006-07-04 Molecular Imprints, Inc. Method for fabricating bulbous-shaped vias
US8349241B2 (en) * 2002-10-04 2013-01-08 Molecular Imprints, Inc. Method to arrange features on a substrate to replicate features having minimal dimensional variability
US6980282B2 (en) * 2002-12-11 2005-12-27 Molecular Imprints, Inc. Method for modulating shapes of substrates
US6929762B2 (en) * 2002-11-13 2005-08-16 Molecular Imprints, Inc. Method of reducing pattern distortions during imprint lithography processes
US6871558B2 (en) * 2002-12-12 2005-03-29 Molecular Imprints, Inc. Method for determining characteristics of substrate employing fluid geometries
US7452574B2 (en) * 2003-02-27 2008-11-18 Molecular Imprints, Inc. Method to reduce adhesion between a polymerizable layer and a substrate employing a fluorine-containing layer
US20040168613A1 (en) * 2003-02-27 2004-09-02 Molecular Imprints, Inc. Composition and method to form a release layer
US7122079B2 (en) * 2004-02-27 2006-10-17 Molecular Imprints, Inc. Composition for an etching mask comprising a silicon-containing material
US7179396B2 (en) * 2003-03-25 2007-02-20 Molecular Imprints, Inc. Positive tone bi-layer imprint lithography method
US7396475B2 (en) * 2003-04-25 2008-07-08 Molecular Imprints, Inc. Method of forming stepped structures employing imprint lithography
US6951173B1 (en) 2003-05-14 2005-10-04 Molecular Imprints, Inc. Assembly and method for transferring imprint lithography templates
US20050160934A1 (en) * 2004-01-23 2005-07-28 Molecular Imprints, Inc. Materials and methods for imprint lithography
US7157036B2 (en) * 2003-06-17 2007-01-02 Molecular Imprints, Inc Method to reduce adhesion between a conformable region and a pattern of a mold
US7136150B2 (en) 2003-09-25 2006-11-14 Molecular Imprints, Inc. Imprint lithography template having opaque alignment marks
US7090716B2 (en) * 2003-10-02 2006-08-15 Molecular Imprints, Inc. Single phase fluid imprint lithography method
US8211214B2 (en) * 2003-10-02 2012-07-03 Molecular Imprints, Inc. Single phase fluid imprint lithography method
US20050084804A1 (en) * 2003-10-16 2005-04-21 Molecular Imprints, Inc. Low surface energy templates
US8076386B2 (en) * 2004-02-23 2011-12-13 Molecular Imprints, Inc. Materials for imprint lithography
US7906180B2 (en) 2004-02-27 2011-03-15 Molecular Imprints, Inc. Composition for an etching mask comprising a silicon-containing material
US20050275311A1 (en) * 2004-06-01 2005-12-15 Molecular Imprints, Inc. Compliant device for nano-scale manufacturing
US20050276919A1 (en) * 2004-06-01 2005-12-15 Molecular Imprints, Inc. Method for dispensing a fluid on a substrate
US7785526B2 (en) * 2004-07-20 2010-08-31 Molecular Imprints, Inc. Imprint alignment method, system, and template
US7105452B2 (en) * 2004-08-13 2006-09-12 Molecular Imprints, Inc. Method of planarizing a semiconductor substrate with an etching chemistry
US7244386B2 (en) 2004-09-27 2007-07-17 Molecular Imprints, Inc. Method of compensating for a volumetric shrinkage of a material disposed upon a substrate to form a substantially planar structure therefrom
EP1645241B1 (de) * 2004-10-05 2011-12-28 BrainLAB AG Positionsmarkersystem mit Punktlichtquellen
US20070231421A1 (en) * 2006-04-03 2007-10-04 Molecular Imprints, Inc. Enhanced Multi Channel Alignment
US7630067B2 (en) 2004-11-30 2009-12-08 Molecular Imprints, Inc. Interferometric analysis method for the manufacture of nano-scale devices
WO2006060757A2 (en) * 2004-12-01 2006-06-08 Molecular Imprints, Inc. Eliminating printability of sub-resolution defects in imprint lithography
US20060119840A1 (en) * 2004-12-08 2006-06-08 Lightwave Energy Systems Co., Inc. Method for sensing and controlling radiation incident on substrate
US20060145398A1 (en) * 2004-12-30 2006-07-06 Board Of Regents, The University Of Texas System Release layer comprising diamond-like carbon (DLC) or doped DLC with tunable composition for imprint lithography templates and contact masks
US7906058B2 (en) * 2005-12-01 2011-03-15 Molecular Imprints, Inc. Bifurcated contact printing technique
US7803308B2 (en) * 2005-12-01 2010-09-28 Molecular Imprints, Inc. Technique for separating a mold from solidified imprinting material
US7670530B2 (en) * 2006-01-20 2010-03-02 Molecular Imprints, Inc. Patterning substrates employing multiple chucks
CN101535021A (zh) * 2005-12-08 2009-09-16 分子制模股份有限公司 用于衬底双面图案形成的方法和系统
KR20090003153A (ko) 2006-04-03 2009-01-09 몰레큘러 임프린츠 인코퍼레이티드 다수의 필드와 정렬 마크를 갖는 기판을 동시에 패턴화하는방법
US8142850B2 (en) 2006-04-03 2012-03-27 Molecular Imprints, Inc. Patterning a plurality of fields on a substrate to compensate for differing evaporation times
US8850980B2 (en) 2006-04-03 2014-10-07 Canon Nanotechnologies, Inc. Tessellated patterns in imprint lithography
US7802978B2 (en) 2006-04-03 2010-09-28 Molecular Imprints, Inc. Imprinting of partial fields at the edge of the wafer
US8012395B2 (en) * 2006-04-18 2011-09-06 Molecular Imprints, Inc. Template having alignment marks formed of contrast material
US7547398B2 (en) * 2006-04-18 2009-06-16 Molecular Imprints, Inc. Self-aligned process for fabricating imprint templates containing variously etched features
US11965731B2 (en) * 2020-11-03 2024-04-23 Taiwan Semiconductor Manufacturing Company Ltd. Package structure and measurement method for the package structure
CN113375579B (zh) * 2021-06-25 2022-08-23 上海工程技术大学 一种栅极组件栅极面间距检测方法及检测平台

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US3263087A (en) * 1963-03-27 1966-07-26 Gen Electric Electro-optical distance gage
US3327584A (en) * 1963-09-09 1967-06-27 Mechanical Tech Inc Fiber optic proximity probe
FR1409565A (fr) * 1963-09-09 1965-08-27 Mechanical Tech Inc Sonde de proximité optique à fibres
FR1534762A (fr) * 1967-05-18 1968-08-02 Cilas Procédé et dispositif de palpage optique
GB1337741A (en) * 1970-06-09 1973-11-21 Vickers Ltd Testing reflecting surfaces
JPS51658Y2 (US06815460-20041109-C00097.png) * 1971-01-19 1976-01-10
US3788741A (en) * 1972-07-26 1974-01-29 Syst Res Labor Inc Distance indicating optical probe

Also Published As

Publication number Publication date
DE2527908A1 (US06815460-20041109-C00097.png) 1976-05-06
US4070116A (en) 1978-01-24
JPS523455A (en) 1977-01-11
DE2527908B1 (de) 1976-05-06
GB1490049A (en) 1977-10-26
FR2325018A1 (fr) 1977-04-15

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Legal Events

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