FR2312104A1 - Canon generateur d'electrons excite par un plasma - Google Patents
Canon generateur d'electrons excite par un plasmaInfo
- Publication number
- FR2312104A1 FR2312104A1 FR7613810A FR7613810A FR2312104A1 FR 2312104 A1 FR2312104 A1 FR 2312104A1 FR 7613810 A FR7613810 A FR 7613810A FR 7613810 A FR7613810 A FR 7613810A FR 2312104 A1 FR2312104 A1 FR 2312104A1
- Authority
- FR
- France
- Prior art keywords
- cannon
- excited
- plasma
- electron generator
- electron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J33/00—Discharge tubes with provision for emergence of electrons or ions from the vessel; Lenard tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
- H01J3/02—Electron guns
- H01J3/021—Electron guns using a field emission, photo emission, or secondary emission electron source
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/578,551 US3970892A (en) | 1975-05-19 | 1975-05-19 | Ion plasma electron gun |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2312104A1 true FR2312104A1 (fr) | 1976-12-17 |
FR2312104B3 FR2312104B3 (fr) | 1979-03-16 |
Family
ID=24313353
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7613810A Granted FR2312104A1 (fr) | 1975-05-19 | 1976-05-07 | Canon generateur d'electrons excite par un plasma |
Country Status (7)
Country | Link |
---|---|
US (1) | US3970892A (fr) |
JP (1) | JPS51141574A (fr) |
DE (1) | DE2619071A1 (fr) |
FR (1) | FR2312104A1 (fr) |
IL (1) | IL49397A0 (fr) |
IT (1) | IT1061555B (fr) |
SE (1) | SE7605585L (fr) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2349209A1 (fr) * | 1976-04-20 | 1977-11-18 | Hughes Aircraft Co | Source a plasma d'ions et d'electrons |
FR2494487A1 (fr) * | 1980-11-14 | 1982-05-21 | Kreindel July | Source d'electrons et d'ions |
EP2079092A1 (fr) * | 2008-01-11 | 2009-07-15 | Excico Group | Dispositif et procédé d'alimentation électrique d'une source d'électrons et source d'électrons à émission secondaire sous bombardement ionique |
FR2926395A1 (fr) * | 2008-01-11 | 2009-07-17 | Excico Group | Source pulsee d'electrons, procede d'alimentation electrique pour source pulsee d'electrons et procede de commande d'une source pulsee d'electrons |
Families Citing this family (43)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4095115A (en) * | 1976-12-27 | 1978-06-13 | Accelerators, Inc. | Ozone generation apparatus and method |
US4755722A (en) * | 1984-04-02 | 1988-07-05 | Rpc Industries | Ion plasma electron gun |
US4694222A (en) * | 1984-04-02 | 1987-09-15 | Rpc Industries | Ion plasma electron gun |
US4647818A (en) * | 1984-04-16 | 1987-03-03 | Sfe Technologies | Nonthermionic hollow anode gas discharge electron beam source |
US4642522A (en) * | 1984-06-18 | 1987-02-10 | Hughes Aircraft Company | Wire-ion-plasma electron gun employing auxiliary grid |
FR2591035B1 (fr) * | 1985-11-29 | 1988-02-26 | Onera (Off Nat Aerospatiale) | Canon a electrons operant par emission secondaire sous bombardement ionique |
US4707637A (en) * | 1986-03-24 | 1987-11-17 | Hughes Aircraft Company | Plasma-anode electron gun |
US4737688A (en) * | 1986-07-22 | 1988-04-12 | Applied Electron Corporation | Wide area source of multiply ionized atomic or molecular species |
US4786844A (en) * | 1987-03-30 | 1988-11-22 | Rpc Industries | Wire ion plasma gun |
US4749911A (en) * | 1987-03-30 | 1988-06-07 | Rpc Industries | Ion plasma electron gun with dose rate control via amplitude modulation of the plasma discharge |
EP0336282B1 (fr) * | 1988-04-08 | 1992-06-10 | Siemens Aktiengesellschaft | Tube à rayons X à plasma, en particulier pour la préionisation des lasers à gaz, méthode de génération de rayons X avec un tel tube et utilisation de ce dernier |
US4910435A (en) * | 1988-07-20 | 1990-03-20 | American International Technologies, Inc. | Remote ion source plasma electron gun |
US5003178A (en) * | 1988-11-14 | 1991-03-26 | Electron Vision Corporation | Large-area uniform electron source |
US5003226A (en) * | 1989-11-16 | 1991-03-26 | Avco Research Laboratories | Plasma cathode |
US5202910A (en) * | 1990-08-28 | 1993-04-13 | North American Philips Corporation | Anode for arc discharge devices |
US5317235A (en) * | 1993-03-22 | 1994-05-31 | Ism Technolog | Magnetically-filtered cathodic arc plasma apparatus |
US5561298A (en) * | 1994-02-09 | 1996-10-01 | Hughes Aircraft Company | Destruction of contaminants using a low-energy electron beam |
US6271529B1 (en) | 1997-12-01 | 2001-08-07 | Ebara Corporation | Ion implantation with charge neutralization |
US6027616A (en) * | 1998-05-01 | 2000-02-22 | Mse Technology Applications, Inc. | Extraction of contaminants from a gas |
US8891583B2 (en) | 2000-11-15 | 2014-11-18 | Ati Properties, Inc. | Refining and casting apparatus and method |
US6496529B1 (en) * | 2000-11-15 | 2002-12-17 | Ati Properties, Inc. | Refining and casting apparatus and method |
DE10215040B4 (de) | 2002-04-05 | 2019-02-21 | Leybold Optics Gmbh | Vorrichtung und Verfahren zum Be- und Entladen einer Vakuumkammer |
US6975073B2 (en) * | 2003-05-19 | 2005-12-13 | George Wakalopulos | Ion plasma beam generating device |
AU2003291513A1 (en) * | 2003-11-12 | 2005-06-29 | International Business Machines Corporation | Ionization test for electrical verification |
US7695590B2 (en) | 2004-03-26 | 2010-04-13 | Applied Materials, Inc. | Chemical vapor deposition plasma reactor having plural ion shower grids |
US8058156B2 (en) * | 2004-07-20 | 2011-11-15 | Applied Materials, Inc. | Plasma immersion ion implantation reactor having multiple ion shower grids |
US7767561B2 (en) | 2004-07-20 | 2010-08-03 | Applied Materials, Inc. | Plasma immersion ion implantation reactor having an ion shower grid |
US20060243379A1 (en) * | 2005-04-29 | 2006-11-02 | E-Beam & Light, Inc. | Method and apparatus for lamination by electron beam irradiation |
US7578960B2 (en) * | 2005-09-22 | 2009-08-25 | Ati Properties, Inc. | Apparatus and method for clean, rapidly solidified alloys |
US7803211B2 (en) * | 2005-09-22 | 2010-09-28 | Ati Properties, Inc. | Method and apparatus for producing large diameter superalloy ingots |
US7803212B2 (en) * | 2005-09-22 | 2010-09-28 | Ati Properties, Inc. | Apparatus and method for clean, rapidly solidified alloys |
US8381047B2 (en) * | 2005-11-30 | 2013-02-19 | Microsoft Corporation | Predicting degradation of a communication channel below a threshold based on data transmission errors |
US8748773B2 (en) * | 2007-03-30 | 2014-06-10 | Ati Properties, Inc. | Ion plasma electron emitters for a melting furnace |
BRPI0809581A2 (pt) | 2007-03-30 | 2019-03-12 | Ati Properties Inc | fornalha de fusão incluindo emissor de elétrons de plasma de íon descarregado por filamento |
US7798199B2 (en) * | 2007-12-04 | 2010-09-21 | Ati Properties, Inc. | Casting apparatus and method |
ATE554497T1 (de) | 2008-01-11 | 2012-05-15 | Excico Group N V | Ionenquelle mit elektrischer entladung über glühfaden |
WO2009112667A1 (fr) * | 2008-01-11 | 2009-09-17 | Excico Group | Source d'ions à décharge électrique par filament |
KR101025932B1 (ko) * | 2008-10-06 | 2011-03-30 | 김용환 | 전자빔 후처리를 이용한 투명성 산화 전극 제조 방법 |
JP5380263B2 (ja) * | 2009-12-15 | 2014-01-08 | キヤノンアネルバ株式会社 | イオンビーム発生器 |
US8747956B2 (en) | 2011-08-11 | 2014-06-10 | Ati Properties, Inc. | Processes, systems, and apparatus for forming products from atomized metals and alloys |
US9257253B1 (en) * | 2014-08-21 | 2016-02-09 | Altair Technologies, Inc. | Systems and methods utilizing a triode hollow cathode electron gun for linear particle accelerators |
CN112582247B (zh) * | 2020-12-14 | 2023-09-12 | 北京无线电计量测试研究所 | 一种用于囚禁离子的小型真空装置和方法 |
DE102023101628A1 (de) | 2023-01-24 | 2024-07-25 | Carl Zeiss Microscopy Gmbh | Teilchenstrahlmikroskop |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3831052A (en) * | 1973-05-25 | 1974-08-20 | Hughes Aircraft Co | Hollow cathode gas discharge device |
-
1975
- 1975-05-19 US US05/578,551 patent/US3970892A/en not_active Expired - Lifetime
-
1976
- 1976-04-12 IL IL49397A patent/IL49397A0/xx unknown
- 1976-05-03 DE DE19762619071 patent/DE2619071A1/de active Pending
- 1976-05-07 FR FR7613810A patent/FR2312104A1/fr active Granted
- 1976-05-17 IT IT49509/76A patent/IT1061555B/it active
- 1976-05-17 SE SE7605585A patent/SE7605585L/xx unknown
- 1976-05-19 JP JP51056740A patent/JPS51141574A/ja active Pending
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2349209A1 (fr) * | 1976-04-20 | 1977-11-18 | Hughes Aircraft Co | Source a plasma d'ions et d'electrons |
FR2494487A1 (fr) * | 1980-11-14 | 1982-05-21 | Kreindel July | Source d'electrons et d'ions |
EP2079092A1 (fr) * | 2008-01-11 | 2009-07-15 | Excico Group | Dispositif et procédé d'alimentation électrique d'une source d'électrons et source d'électrons à émission secondaire sous bombardement ionique |
FR2926395A1 (fr) * | 2008-01-11 | 2009-07-17 | Excico Group | Source pulsee d'electrons, procede d'alimentation electrique pour source pulsee d'electrons et procede de commande d'une source pulsee d'electrons |
WO2009106759A1 (fr) * | 2008-01-11 | 2009-09-03 | Excico Group | Source puisée d'électrons, procédé d'alimentation électrique pour source puisée d'électrons et procédé de commande d'une source puisée d'électrons |
WO2009112668A1 (fr) * | 2008-01-11 | 2009-09-17 | Excico Group | Dispositif et procédé d'alimentation électrique d'une source d'électrons et source d'électrons à émission secondaire sous bombardement ionique |
CN101952926B (zh) * | 2008-01-11 | 2012-11-21 | 埃克西可集团公司 | 脉冲电子源、脉冲电子源的供电方法和控制脉冲电子源的方法 |
US8664863B2 (en) | 2008-01-11 | 2014-03-04 | Excico Group | Device and method of supplying power to an electron source, and ion-bombardment-induced secondary-emission electron source |
US8698402B2 (en) | 2008-01-11 | 2014-04-15 | Excico Group | Pulsed electron source, power supply method for pulsed electron source and method for controlling a pulsed electron source |
TWI470919B (zh) * | 2008-01-11 | 2015-01-21 | Excico Group Nv | An electron source and a secondary emission electron source under an ion impact |
Also Published As
Publication number | Publication date |
---|---|
US3970892A (en) | 1976-07-20 |
JPS51141574A (en) | 1976-12-06 |
IT1061555B (it) | 1983-04-30 |
DE2619071A1 (de) | 1976-12-02 |
SE7605585L (sv) | 1976-11-20 |
IL49397A0 (en) | 1976-09-30 |
FR2312104B3 (fr) | 1979-03-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |