FR2309896B1 - - Google Patents

Info

Publication number
FR2309896B1
FR2309896B1 FR7612538A FR7612538A FR2309896B1 FR 2309896 B1 FR2309896 B1 FR 2309896B1 FR 7612538 A FR7612538 A FR 7612538A FR 7612538 A FR7612538 A FR 7612538A FR 2309896 B1 FR2309896 B1 FR 2309896B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7612538A
Other languages
French (fr)
Other versions
FR2309896A1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CNA Holdings LLC
Original Assignee
American Hoechst Corp
Hoechst Celanese Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by American Hoechst Corp, Hoechst Celanese Corp filed Critical American Hoechst Corp
Publication of FR2309896A1 publication Critical patent/FR2309896A1/en
Application granted granted Critical
Publication of FR2309896B1 publication Critical patent/FR2309896B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
FR7612538A 1975-04-29 1976-04-28 PHOTOSENSITIVE COPY MATERIAL Granted FR2309896A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US57266275A 1975-04-29 1975-04-29

Publications (2)

Publication Number Publication Date
FR2309896A1 FR2309896A1 (en) 1976-11-26
FR2309896B1 true FR2309896B1 (en) 1979-04-20

Family

ID=24288819

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7612538A Granted FR2309896A1 (en) 1975-04-29 1976-04-28 PHOTOSENSITIVE COPY MATERIAL

Country Status (4)

Country Link
BE (1) BE841190A (en)
DE (1) DE2617088A1 (en)
FR (1) FR2309896A1 (en)
GB (1) GB1546971A (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1119447A (en) * 1978-09-06 1982-03-09 John P. Vikesland Positive-acting photoresist composition containing a crosslinked urethane resin, a cured epoxy resin and a photosensitizer
DE3023201A1 (en) * 1980-06-21 1982-01-07 Hoechst Ag, 6000 Frankfurt POSITIVELY WORKING RADIATION-SENSITIVE MIXTURE
EP0087262A1 (en) * 1982-02-22 1983-08-31 Minnesota Mining And Manufacturing Company Positive acting photosensitive compositions
DE3445276A1 (en) * 1984-12-12 1986-06-19 Hoechst Ag, 6230 Frankfurt RADIATION-SENSITIVE MIXTURE, LIGHT-SENSITIVE RECORDING MATERIAL MADE THEREOF AND METHOD FOR PRODUCING A FLAT PRINTING FORM
DE69028834T2 (en) * 1989-12-01 1997-02-13 Tosoh Corp Positive working photosensitive compositions for the production of lenses
US6462107B1 (en) * 1997-12-23 2002-10-08 The Texas A&M University System Photoimageable compositions and films for printed wiring board manufacture
EP2233288A1 (en) * 2009-03-23 2010-09-29 Founder Fine Chemical Industry Co., Ltd. Radiation sensitive composition and method for preparing radiation sensitive composition

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1538320A (en) * 1965-11-02 1968-09-06 Ferrania Spa Manufacturing process of presensitized dies for offset printing
DE2053363C3 (en) * 1970-10-30 1980-09-18 Hoechst Ag, 6000 Frankfurt Photosensitive mixture
AR205345A1 (en) * 1973-06-20 1976-04-30 Minnesota Mining & Mfg PHOTOSENSITIVE ORGANOPHILIC COMPOSITION AND LITHOGRAPHIC PLATE PREPARED WITH THE SAME

Also Published As

Publication number Publication date
BE841190A (en) 1976-10-27
FR2309896A1 (en) 1976-11-26
GB1546971A (en) 1979-06-06
DE2617088A1 (en) 1976-11-11

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Legal Events

Date Code Title Description
ST Notification of lapse