FR2299666B2 - - Google Patents

Info

Publication number
FR2299666B2
FR2299666B2 FR7502889A FR7502889A FR2299666B2 FR 2299666 B2 FR2299666 B2 FR 2299666B2 FR 7502889 A FR7502889 A FR 7502889A FR 7502889 A FR7502889 A FR 7502889A FR 2299666 B2 FR2299666 B2 FR 2299666B2
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7502889A
Other languages
French (fr)
Other versions
FR2299666A2 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Priority to FR7502889A priority Critical patent/FR2299666A2/fr
Publication of FR2299666A2 publication Critical patent/FR2299666A2/fr
Application granted granted Critical
Publication of FR2299666B2 publication Critical patent/FR2299666B2/fr
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
FR7502889A 1975-01-30 1975-01-30 Proce Granted FR2299666A2 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7502889A FR2299666A2 (fr) 1975-01-30 1975-01-30 Proce

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7502889A FR2299666A2 (fr) 1975-01-30 1975-01-30 Proce

Publications (2)

Publication Number Publication Date
FR2299666A2 FR2299666A2 (fr) 1976-08-27
FR2299666B2 true FR2299666B2 (ja) 1980-04-30

Family

ID=9150508

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7502889A Granted FR2299666A2 (fr) 1975-01-30 1975-01-30 Proce

Country Status (1)

Country Link
FR (1) FR2299666A2 (ja)

Also Published As

Publication number Publication date
FR2299666A2 (fr) 1976-08-27

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