FR2297872A1 - Nouveaux polyesters photosensibles et leurs applications, notamment photographiques - Google Patents
Nouveaux polyesters photosensibles et leurs applications, notamment photographiquesInfo
- Publication number
- FR2297872A1 FR2297872A1 FR7501396A FR7501396A FR2297872A1 FR 2297872 A1 FR2297872 A1 FR 2297872A1 FR 7501396 A FR7501396 A FR 7501396A FR 7501396 A FR7501396 A FR 7501396A FR 2297872 A1 FR2297872 A1 FR 2297872A1
- Authority
- FR
- France
- Prior art keywords
- units
- photoresists
- radiation curable
- curable adhesives
- high mol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
- C08G63/02—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
- C08G63/12—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from polycarboxylic acids and polyhydroxy compounds
- C08G63/52—Polycarboxylic acids or polyhydroxy compounds in which at least one of the two components contains aliphatic unsaturation
- C08G63/54—Polycarboxylic acids or polyhydroxy compounds in which at least one of the two components contains aliphatic unsaturation the acids or hydroxy compounds containing carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
- C08G63/66—Polyesters containing oxygen in the form of ether groups
- C08G63/668—Polyesters containing oxygen in the form of ether groups derived from polycarboxylic acids and polyhydroxy compounds
- C08G63/676—Polyesters containing oxygen in the form of ether groups derived from polycarboxylic acids and polyhydroxy compounds in which at least one of the two components contains aliphatic unsaturation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0384—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the main chain of the photopolymer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Polyesters Or Polycarbonates (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7501396A FR2297872A1 (fr) | 1975-01-17 | 1975-01-17 | Nouveaux polyesters photosensibles et leurs applications, notamment photographiques |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7501396A FR2297872A1 (fr) | 1975-01-17 | 1975-01-17 | Nouveaux polyesters photosensibles et leurs applications, notamment photographiques |
Publications (1)
Publication Number | Publication Date |
---|---|
FR2297872A1 true FR2297872A1 (fr) | 1976-08-13 |
Family
ID=9149949
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7501396A Withdrawn FR2297872A1 (fr) | 1975-01-17 | 1975-01-17 | Nouveaux polyesters photosensibles et leurs applications, notamment photographiques |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR2297872A1 (fr) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0008828A2 (fr) * | 1978-09-06 | 1980-03-19 | EASTMAN KODAK COMPANY (a New Jersey corporation) | Polymères photoréticulables, résistant aux hautes températures, et leur application dans des dispositifs de reproduction d'images en couleurs |
EP0272692A2 (fr) * | 1986-12-29 | 1988-06-29 | EASTMAN KODAK COMPANY (a New Jersey corporation) | Copolymères de condensation contenant des unités de di-méthine et ses produits |
WO1989000498A1 (fr) * | 1987-07-10 | 1989-01-26 | Siemens Aktiengesellschaft | Procede de collage de deux parties plates avec un film de vernis photosensible |
EP0501312A1 (fr) * | 1991-02-21 | 1992-09-02 | Toyo Boseki Kabushiki Kaisha | Procédé pour le traitement de la péripherie d'une plaque résineuse photosensible non exposée |
-
1975
- 1975-01-17 FR FR7501396A patent/FR2297872A1/fr not_active Withdrawn
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0008828A2 (fr) * | 1978-09-06 | 1980-03-19 | EASTMAN KODAK COMPANY (a New Jersey corporation) | Polymères photoréticulables, résistant aux hautes températures, et leur application dans des dispositifs de reproduction d'images en couleurs |
EP0008828A3 (en) * | 1978-09-06 | 1980-04-30 | Eastman±Kodak Company | Photocrosslinkable, high-temperature-resistant polymers and their use in color imaging devices |
EP0272692A2 (fr) * | 1986-12-29 | 1988-06-29 | EASTMAN KODAK COMPANY (a New Jersey corporation) | Copolymères de condensation contenant des unités de di-méthine et ses produits |
EP0272692A3 (fr) * | 1986-12-29 | 1989-09-13 | EASTMAN KODAK COMPANY (a New Jersey corporation) | Copolymères de condensation contenant des unités de di-méthine et ses produits |
WO1989000498A1 (fr) * | 1987-07-10 | 1989-01-26 | Siemens Aktiengesellschaft | Procede de collage de deux parties plates avec un film de vernis photosensible |
EP0501312A1 (fr) * | 1991-02-21 | 1992-09-02 | Toyo Boseki Kabushiki Kaisha | Procédé pour le traitement de la péripherie d'une plaque résineuse photosensible non exposée |
US6150076A (en) * | 1991-02-21 | 2000-11-21 | Toyo Boseki Kabushiki Kaisha | Process for treating periphery of unexposed photosensitive resin plate |
US6348300B1 (en) | 1991-02-21 | 2002-02-19 | Toyo Boseki Kabushiki Kaisha | Process for treating periphery of unexposed photosensitive resin plate |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |