FR2282660A1 - METHOD FOR MANUFACTURING A LIGHT-SENSITIVE OFFSET PRINTING PLATE - Google Patents

METHOD FOR MANUFACTURING A LIGHT-SENSITIVE OFFSET PRINTING PLATE

Info

Publication number
FR2282660A1
FR2282660A1 FR7525487A FR7525487A FR2282660A1 FR 2282660 A1 FR2282660 A1 FR 2282660A1 FR 7525487 A FR7525487 A FR 7525487A FR 7525487 A FR7525487 A FR 7525487A FR 2282660 A1 FR2282660 A1 FR 2282660A1
Authority
FR
France
Prior art keywords
manufacturing
light
printing plate
offset printing
sensitive offset
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7525487A
Other languages
French (fr)
Other versions
FR2282660B3 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Publication of FR2282660A1 publication Critical patent/FR2282660A1/en
Application granted granted Critical
Publication of FR2282660B3 publication Critical patent/FR2282660B3/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
FR7525487A 1974-08-19 1975-08-18 METHOD FOR MANUFACTURING A LIGHT-SENSITIVE OFFSET PRINTING PLATE Granted FR2282660A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19742439730 DE2439730C2 (en) 1974-08-19 1974-08-19 Method of making a photosensitive offset printing plate

Publications (2)

Publication Number Publication Date
FR2282660A1 true FR2282660A1 (en) 1976-03-19
FR2282660B3 FR2282660B3 (en) 1978-04-07

Family

ID=5923563

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7525487A Granted FR2282660A1 (en) 1974-08-19 1975-08-18 METHOD FOR MANUFACTURING A LIGHT-SENSITIVE OFFSET PRINTING PLATE

Country Status (6)

Country Link
JP (1) JPS5814674B2 (en)
CA (1) CA1044512A (en)
DE (1) DE2439730C2 (en)
FR (1) FR2282660A1 (en)
GB (1) GB1514506A (en)
IT (1) IT1041240B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0131299A2 (en) * 1983-07-11 1985-01-16 E.I. Du Pont De Nemours And Company Controlled roughening of photosensitive composition

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57171591U (en) * 1981-04-23 1982-10-28
EP0109183A3 (en) * 1982-10-14 1985-04-03 Unilever Plc Lithographic printing
JPS59181586U (en) * 1983-05-20 1984-12-04 日本電池株式会社 Leak-free lead acid battery
DE3433247A1 (en) * 1984-09-11 1986-03-20 Hoechst Ag, 6230 Frankfurt RADIATION-SENSITIVE RECORDING MATERIAL AND METHOD FOR THE PRODUCTION THEREOF
JPH0425295Y2 (en) * 1985-05-13 1992-06-17

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1813445C3 (en) * 1968-12-09 1979-04-12 Hoechst Ag, 6000 Frankfurt Photosensitive copying material for the production of a collotype and process for the production of the collotype
US3891443A (en) * 1973-02-01 1975-06-24 Polychrome Corp Mat finish photosensitive relief plates

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0131299A2 (en) * 1983-07-11 1985-01-16 E.I. Du Pont De Nemours And Company Controlled roughening of photosensitive composition
EP0131299A3 (en) * 1983-07-11 1986-08-20 E.I. Du Pont De Nemours And Company Controlled roughening of photosensitive composition

Also Published As

Publication number Publication date
DE2439730A1 (en) 1976-03-04
IT1041240B (en) 1980-01-10
DE2439730C2 (en) 1983-09-15
JPS5144004A (en) 1976-04-15
JPS5814674B2 (en) 1983-03-22
CA1044512A (en) 1978-12-19
GB1514506A (en) 1978-06-14
FR2282660B3 (en) 1978-04-07

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