FR2263028B3 - - Google Patents

Info

Publication number
FR2263028B3
FR2263028B3 FR7407457A FR7407457A FR2263028B3 FR 2263028 B3 FR2263028 B3 FR 2263028B3 FR 7407457 A FR7407457 A FR 7407457A FR 7407457 A FR7407457 A FR 7407457A FR 2263028 B3 FR2263028 B3 FR 2263028B3
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7407457A
Other languages
French (fr)
Other versions
FR2263028A1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
GAMMA IND
Original Assignee
GAMMA IND
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by GAMMA IND filed Critical GAMMA IND
Priority to FR7407457A priority Critical patent/FR2263028A1/fr
Publication of FR2263028A1 publication Critical patent/FR2263028A1/fr
Application granted granted Critical
Publication of FR2263028B3 publication Critical patent/FR2263028B3/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/081—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing particle radiation or gamma-radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/48—Ion implantation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Vapour Deposition (AREA)
FR7407457A 1974-03-05 1974-03-05 Ion implantation appts with test substrate - for controlling parameters of the ion beam Granted FR2263028A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7407457A FR2263028A1 (en) 1974-03-05 1974-03-05 Ion implantation appts with test substrate - for controlling parameters of the ion beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7407457A FR2263028A1 (en) 1974-03-05 1974-03-05 Ion implantation appts with test substrate - for controlling parameters of the ion beam

Publications (2)

Publication Number Publication Date
FR2263028A1 FR2263028A1 (en) 1975-10-03
FR2263028B3 true FR2263028B3 (ja) 1976-12-10

Family

ID=9135861

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7407457A Granted FR2263028A1 (en) 1974-03-05 1974-03-05 Ion implantation appts with test substrate - for controlling parameters of the ion beam

Country Status (1)

Country Link
FR (1) FR2263028A1 (ja)

Also Published As

Publication number Publication date
FR2263028A1 (en) 1975-10-03

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Legal Events

Date Code Title Description
ST Notification of lapse