FR2257930B1 - - Google Patents

Info

Publication number
FR2257930B1
FR2257930B1 FR7309567A FR7309567A FR2257930B1 FR 2257930 B1 FR2257930 B1 FR 2257930B1 FR 7309567 A FR7309567 A FR 7309567A FR 7309567 A FR7309567 A FR 7309567A FR 2257930 B1 FR2257930 B1 FR 2257930B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7309567A
Other languages
French (fr)
Other versions
FR2257930A1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
INST KOMPLEXNYKH
Original Assignee
INST KOMPLEXNYKH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by INST KOMPLEXNYKH filed Critical INST KOMPLEXNYKH
Priority to FR7309567A priority Critical patent/FR2257930A1/en
Publication of FR2257930A1 publication Critical patent/FR2257930A1/en
Application granted granted Critical
Publication of FR2257930B1 publication Critical patent/FR2257930B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
FR7309567A 1973-03-16 1973-03-16 Photo sensitive materials prodn for photo printing plates - with thicker photo sensitive coatings Granted FR2257930A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7309567A FR2257930A1 (en) 1973-03-16 1973-03-16 Photo sensitive materials prodn for photo printing plates - with thicker photo sensitive coatings

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7309567A FR2257930A1 (en) 1973-03-16 1973-03-16 Photo sensitive materials prodn for photo printing plates - with thicker photo sensitive coatings

Publications (2)

Publication Number Publication Date
FR2257930A1 FR2257930A1 (en) 1975-08-08
FR2257930B1 true FR2257930B1 (en) 1977-04-29

Family

ID=9116432

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7309567A Granted FR2257930A1 (en) 1973-03-16 1973-03-16 Photo sensitive materials prodn for photo printing plates - with thicker photo sensitive coatings

Country Status (1)

Country Link
FR (1) FR2257930A1 (en)

Also Published As

Publication number Publication date
FR2257930A1 (en) 1975-08-08

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Legal Events

Date Code Title Description
ST Notification of lapse