FR2227344B2 - - Google Patents
Info
- Publication number
- FR2227344B2 FR2227344B2 FR7315281A FR7315281A FR2227344B2 FR 2227344 B2 FR2227344 B2 FR 2227344B2 FR 7315281 A FR7315281 A FR 7315281A FR 7315281 A FR7315281 A FR 7315281A FR 2227344 B2 FR2227344 B2 FR 2227344B2
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
- H01J37/32853—Hygiene
- H01J37/32862—In situ cleaning of vessels and/or internal parts
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32568—Relative arrangement or disposition of electrodes; moving means
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Epidemiology (AREA)
- Health & Medical Sciences (AREA)
- Public Health (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7315281A FR2227344A2 (en) | 1972-10-27 | 1973-04-27 | Vacuum chamber for cathode sputtering - with electrode and substrate cleaning disc |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7238211A FR2204708A1 (en) | 1972-10-27 | 1972-10-27 | Vacuum chamber for cathode sputtering - for prepn. of multiple thin layers by sputtering and evapn. inside the same chamber |
| FR7315281A FR2227344A2 (en) | 1972-10-27 | 1973-04-27 | Vacuum chamber for cathode sputtering - with electrode and substrate cleaning disc |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2227344A2 FR2227344A2 (en) | 1974-11-22 |
| FR2227344B2 true FR2227344B2 (enrdf_load_stackoverflow) | 1979-01-12 |
Family
ID=32232278
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7315281A Granted FR2227344A2 (en) | 1972-10-27 | 1973-04-27 | Vacuum chamber for cathode sputtering - with electrode and substrate cleaning disc |
Country Status (1)
| Country | Link |
|---|---|
| FR (1) | FR2227344A2 (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107881480B (zh) * | 2017-12-25 | 2019-03-26 | 苏州浩联光电科技有限公司 | 一种镀膜飞行平衡装置以及镀膜系统 |
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1973
- 1973-04-27 FR FR7315281A patent/FR2227344A2/fr active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| FR2227344A2 (en) | 1974-11-22 |