FR2219526B1 - - Google Patents

Info

Publication number
FR2219526B1
FR2219526B1 FR7405924A FR7405924A FR2219526B1 FR 2219526 B1 FR2219526 B1 FR 2219526B1 FR 7405924 A FR7405924 A FR 7405924A FR 7405924 A FR7405924 A FR 7405924A FR 2219526 B1 FR2219526 B1 FR 2219526B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7405924A
Other versions
FR2219526A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Publication of FR2219526A1 publication Critical patent/FR2219526A1/fr
Application granted granted Critical
Publication of FR2219526B1 publication Critical patent/FR2219526B1/fr
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/0603Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions
    • H01L29/0607Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration
    • H01L29/0638Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for preventing surface leakage due to surface inversion layer, e.g. with channel stopper
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105After-treatment
    • H01L21/3115Doping the insulating layers
    • H01L21/31155Doping the insulating layers by ion implantation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00Semiconductor device manufacturing: process
    • Y10S438/91Controlling charging state at semiconductor-insulator interface
FR7405924A 1973-02-22 1974-02-21 Expired FR2219526B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19732308803 DE2308803A1 (de) 1973-02-22 1973-02-22 Verfahren zur dotierung einer isolationsschicht

Publications (2)

Publication Number Publication Date
FR2219526A1 FR2219526A1 (fr) 1974-09-20
FR2219526B1 true FR2219526B1 (fr) 1978-02-10

Family

ID=5872759

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7405924A Expired FR2219526B1 (fr) 1973-02-22 1974-02-21

Country Status (6)

Country Link
US (1) US3915755A (fr)
JP (1) JPS49115660A (fr)
DE (1) DE2308803A1 (fr)
FR (1) FR2219526B1 (fr)
GB (1) GB1413261A (fr)
IT (1) IT1008260B (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5140078A (en) * 1974-10-01 1976-04-03 Tokyo Shibaura Electric Co Handotaisochino seizohoho
US4024563A (en) * 1975-09-02 1977-05-17 Texas Instruments Incorporated Doped oxide buried channel charge-coupled device
EP0024305B1 (fr) * 1979-08-16 1985-05-02 International Business Machines Corporation Procédé pour l'application de pellicules de SiO2 par dépôt chimique en phase vapeur
US4592129A (en) * 1985-04-01 1986-06-03 Motorola, Inc. Method of making an integral, multiple layer antireflection coating by hydrogen ion implantation
KR100263476B1 (ko) * 1998-03-24 2000-09-01 김영환 가변회로 컨넥터 형성방법
JP2019054068A (ja) * 2017-09-13 2019-04-04 東芝メモリ株式会社 半導体記憶装置及びその製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3660735A (en) * 1969-09-10 1972-05-02 Sprague Electric Co Complementary metal insulator silicon transistor pairs

Also Published As

Publication number Publication date
FR2219526A1 (fr) 1974-09-20
DE2308803A1 (de) 1974-08-29
IT1008260B (it) 1976-11-10
JPS49115660A (fr) 1974-11-05
GB1413261A (en) 1975-11-12
US3915755A (en) 1975-10-28

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Legal Events

Date Code Title Description
ST Notification of lapse