FR2196488B1 - - Google Patents
Info
- Publication number
- FR2196488B1 FR2196488B1 FR7329564A FR7329564A FR2196488B1 FR 2196488 B1 FR2196488 B1 FR 2196488B1 FR 7329564 A FR7329564 A FR 7329564A FR 7329564 A FR7329564 A FR 7329564A FR 2196488 B1 FR2196488 B1 FR 2196488B1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP47082087A JPS5040043B2 (ko) | 1972-08-18 | 1972-08-18 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2196488A1 FR2196488A1 (ko) | 1974-03-15 |
FR2196488B1 true FR2196488B1 (ko) | 1974-11-08 |
Family
ID=13764647
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7329564A Expired FR2196488B1 (ko) | 1972-08-18 | 1973-08-13 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPS5040043B2 (ko) |
DE (1) | DE2341734B2 (ko) |
FR (1) | FR2196488B1 (ko) |
GB (1) | GB1426376A (ko) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS513621A (en) * | 1974-06-28 | 1976-01-13 | Shigeru Usami | Reriifusakuseihoho |
FR2514159A1 (fr) * | 1981-10-02 | 1983-04-08 | Rhone Poulenc Syst | Composition photosensible et plaque lithographique realisee a l'aide de cette composition |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE525225A (ko) * | 1951-08-20 | |||
US3573975A (en) * | 1968-07-10 | 1971-04-06 | Ibm | Photochemical fabrication process |
CA923358A (en) * | 1969-08-01 | 1973-03-27 | Fuji Photo Film Co. | Light-sensitive stencil printing material |
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1972
- 1972-08-18 JP JP47082087A patent/JPS5040043B2/ja not_active Expired
-
1973
- 1973-08-13 FR FR7329564A patent/FR2196488B1/fr not_active Expired
- 1973-08-17 DE DE19732341734 patent/DE2341734B2/de not_active Ceased
- 1973-08-17 GB GB3891573A patent/GB1426376A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
FR2196488A1 (ko) | 1974-03-15 |
GB1426376A (en) | 1976-02-25 |
JPS4937702A (ko) | 1974-04-08 |
JPS5040043B2 (ko) | 1975-12-22 |
DE2341734B2 (de) | 1978-09-14 |
DE2341734A1 (de) | 1974-03-07 |