FR2193212A1 - - Google Patents
Info
- Publication number
- FR2193212A1 FR2193212A1 FR7321287A FR7321287A FR2193212A1 FR 2193212 A1 FR2193212 A1 FR 2193212A1 FR 7321287 A FR7321287 A FR 7321287A FR 7321287 A FR7321287 A FR 7321287A FR 2193212 A1 FR2193212 A1 FR 2193212A1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/494—Silver salt compositions other than silver halide emulsions; Photothermographic systems ; Thermographic systems using noble metal compounds
- G03C1/496—Binder-free compositions, e.g. evaporated
- G03C1/4965—Binder-free compositions, e.g. evaporated evaporated
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
- G03F7/0952—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer comprising silver halide or silver salt based image forming systems, e.g. for camera speed exposure
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0002—Apparatus or processes for manufacturing printed circuits for manufacturing artworks for printed circuits
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/136—Coating process making radiation sensitive element
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
BG20980A BG17215A1 (fr) | 1972-07-17 | 1972-07-17 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2193212A1 true FR2193212A1 (fr) | 1974-02-15 |
FR2193212B1 FR2193212B1 (fr) | 1977-05-06 |
Family
ID=3898722
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7321287A Expired FR2193212B1 (fr) | 1972-07-17 | 1973-06-12 |
Country Status (10)
Country | Link |
---|---|
US (1) | US3892571A (fr) |
JP (1) | JPS5651611B2 (fr) |
BE (1) | BE800821A (fr) |
BG (1) | BG17215A1 (fr) |
CH (1) | CH600379A5 (fr) |
DE (1) | DE2335072A1 (fr) |
FR (1) | FR2193212B1 (fr) |
GB (1) | GB1384037A (fr) |
IT (1) | IT985713B (fr) |
NL (1) | NL7308326A (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2351433A1 (fr) * | 1976-05-14 | 1977-12-09 | Gaf Corp | Matiere et epreuves photographiques |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5340281A (en) * | 1976-09-27 | 1978-04-12 | Konishiroku Photo Ind Co Ltd | Photo mask material and manufacturtof it |
US4276368A (en) * | 1979-05-04 | 1981-06-30 | Bell Telephone Laboratories, Incorporated | Photoinduced migration of silver into chalcogenide layer |
US4329410A (en) * | 1979-12-26 | 1982-05-11 | The Perkin-Elmer Corporation | Production of X-ray lithograph masks |
US4664996A (en) * | 1983-06-24 | 1987-05-12 | Rca Corporation | Method for etching a flat apertured mask for use in a cathode-ray tube |
US4656107A (en) * | 1983-06-24 | 1987-04-07 | Rca Corporation | Photographic printing plate for use in a vacuum printing frame |
DE3626708A1 (de) * | 1986-08-07 | 1988-02-11 | Mania Gmbh | Verfahren zur herstellung von leiterplatten |
US5278008A (en) * | 1990-10-31 | 1994-01-11 | Hughes Aircraft Company | Diffraction efficiency control in holographic elements |
US6350555B1 (en) * | 1998-01-14 | 2002-02-26 | Precision Coatings, Inc. | Direct write imaging medium |
US20020168586A1 (en) * | 2001-05-10 | 2002-11-14 | Shih-Che Lo | Near field optical disk |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1267623A (fr) * | 1959-09-18 | 1961-07-21 | Technical Operations Inc | Matériau sensible pour photographie et son procédé de fabrication |
US3578451A (en) * | 1967-03-29 | 1971-05-11 | Scott Paper Co | Integral negative type positive photolithographic plate |
US3674492A (en) * | 1970-12-09 | 1972-07-04 | Bell Telephone Labor Inc | Laminar photomask |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE635636A (fr) * | 1962-08-01 | |||
US3488194A (en) * | 1966-06-09 | 1970-01-06 | Eastman Kodak Co | Photosensitive metal plate |
GB1187980A (en) * | 1966-10-28 | 1970-04-15 | Ilford Ltd | Presensitised Lithographic Plates. |
US3681227A (en) * | 1970-06-29 | 1972-08-01 | Corning Glass Works | Microcircuit mask and method |
US3730720A (en) * | 1970-08-05 | 1973-05-01 | Bell Telephone Labor Inc | Fabrication of integrated optical circuits |
-
1972
- 1972-07-17 BG BG20980A patent/BG17215A1/xx unknown
-
1973
- 1973-06-12 FR FR7321287A patent/FR2193212B1/fr not_active Expired
- 1973-06-13 BE BE2052835A patent/BE800821A/fr unknown
- 1973-06-15 NL NL7308326A patent/NL7308326A/xx not_active Application Discontinuation
- 1973-06-19 IT IT50895/73A patent/IT985713B/it active
- 1973-06-26 GB GB3043273A patent/GB1384037A/en not_active Expired
- 1973-07-05 US US376712A patent/US3892571A/en not_active Expired - Lifetime
- 1973-07-10 DE DE19732335072 patent/DE2335072A1/de active Granted
- 1973-07-12 CH CH1029373A patent/CH600379A5/xx not_active IP Right Cessation
- 1973-07-17 JP JP8241573A patent/JPS5651611B2/ja not_active Expired
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1267623A (fr) * | 1959-09-18 | 1961-07-21 | Technical Operations Inc | Matériau sensible pour photographie et son procédé de fabrication |
US3578451A (en) * | 1967-03-29 | 1971-05-11 | Scott Paper Co | Integral negative type positive photolithographic plate |
US3674492A (en) * | 1970-12-09 | 1972-07-04 | Bell Telephone Labor Inc | Laminar photomask |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2351433A1 (fr) * | 1976-05-14 | 1977-12-09 | Gaf Corp | Matiere et epreuves photographiques |
Also Published As
Publication number | Publication date |
---|---|
CH600379A5 (fr) | 1978-06-15 |
BE800821A (fr) | 1973-10-01 |
GB1384037A (en) | 1975-02-19 |
JPS4992980A (fr) | 1974-09-04 |
IT985713B (it) | 1974-12-20 |
US3892571A (en) | 1975-07-01 |
DE2335072B2 (fr) | 1978-07-27 |
DE2335072C3 (fr) | 1979-03-29 |
JPS5651611B2 (fr) | 1981-12-07 |
BG17215A1 (fr) | 1973-07-25 |
NL7308326A (fr) | 1974-01-21 |
FR2193212B1 (fr) | 1977-05-06 |
DE2335072A1 (de) | 1974-02-21 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |