FR2185445B1 - - Google Patents

Info

Publication number
FR2185445B1
FR2185445B1 FR7317471A FR7317471A FR2185445B1 FR 2185445 B1 FR2185445 B1 FR 2185445B1 FR 7317471 A FR7317471 A FR 7317471A FR 7317471 A FR7317471 A FR 7317471A FR 2185445 B1 FR2185445 B1 FR 2185445B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7317471A
Other languages
French (fr)
Other versions
FR2185445A1 (jp
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of FR2185445A1 publication Critical patent/FR2185445A1/fr
Application granted granted Critical
Publication of FR2185445B1 publication Critical patent/FR2185445B1/fr
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02Elements
    • C30B29/06Silicon
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02Epitaxial-layer growth

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
FR7317471A 1972-05-20 1973-05-15 Expired FR2185445B1 (jp)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7206877A NL7206877A (jp) 1972-05-20 1972-05-20

Publications (2)

Publication Number Publication Date
FR2185445A1 FR2185445A1 (jp) 1974-01-04
FR2185445B1 true FR2185445B1 (jp) 1976-06-11

Family

ID=19816097

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7317471A Expired FR2185445B1 (jp) 1972-05-20 1973-05-15

Country Status (7)

Country Link
JP (1) JPS5225295B2 (jp)
CA (1) CA990626A (jp)
DE (1) DE2324127A1 (jp)
FR (1) FR2185445B1 (jp)
GB (1) GB1406760A (jp)
IT (1) IT985922B (jp)
NL (1) NL7206877A (jp)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0045600B1 (en) * 1980-07-28 1984-10-10 Monsanto Company Improved method for producing semiconductor grade silicon
JPS6169116A (ja) * 1984-09-13 1986-04-09 Toshiba Ceramics Co Ltd シリコンウエハ−の連続cvdコ−テイング用サセプター
JP3725598B2 (ja) * 1996-01-12 2005-12-14 東芝セラミックス株式会社 エピタキシャルウェハの製造方法
JP2006070342A (ja) * 2004-09-03 2006-03-16 Sumitomo Electric Ind Ltd 気相成膜装置、サセプタおよび気相成膜方法
JP6333646B2 (ja) 2014-07-08 2018-05-30 ビーエーエスエフ コーティングス ゲゼルシャフト ミット ベシュレンクテル ハフツングBASF Coatings GmbH 二液型塗料組成物及びそれを用いた複層塗膜形成方法

Also Published As

Publication number Publication date
NL7206877A (jp) 1973-11-22
JPS5225295B2 (jp) 1977-07-06
CA990626A (en) 1976-06-08
IT985922B (it) 1974-12-30
FR2185445A1 (jp) 1974-01-04
DE2324127A1 (de) 1973-12-06
GB1406760A (en) 1975-09-17
JPS4943572A (jp) 1974-04-24

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Legal Events

Date Code Title Description
ST Notification of lapse