FR2183557B3 - - Google Patents

Info

Publication number
FR2183557B3
FR2183557B3 FR7216677A FR7216677A FR2183557B3 FR 2183557 B3 FR2183557 B3 FR 2183557B3 FR 7216677 A FR7216677 A FR 7216677A FR 7216677 A FR7216677 A FR 7216677A FR 2183557 B3 FR2183557 B3 FR 2183557B3
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7216677A
Other languages
French (fr)
Other versions
FR2183557A1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alcatel CIT SA
Nokia Inc
Original Assignee
Alcatel CIT SA
Nokia Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alcatel CIT SA, Nokia Inc filed Critical Alcatel CIT SA
Priority to FR7216677A priority Critical patent/FR2183557A1/fr
Publication of FR2183557A1 publication Critical patent/FR2183557A1/fr
Application granted granted Critical
Publication of FR2183557B3 publication Critical patent/FR2183557B3/fr
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/354—Introduction of auxiliary energy into the plasma
    • C23C14/355—Introduction of auxiliary energy into the plasma using electrons, e.g. triode sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Physical Vapour Deposition (AREA)
FR7216677A 1972-05-10 1972-05-10 Cathodic sputtering appts - with number of chambers for simultaneous treatment of several substrates Granted FR2183557A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7216677A FR2183557A1 (en) 1972-05-10 1972-05-10 Cathodic sputtering appts - with number of chambers for simultaneous treatment of several substrates

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7216677A FR2183557A1 (en) 1972-05-10 1972-05-10 Cathodic sputtering appts - with number of chambers for simultaneous treatment of several substrates

Publications (2)

Publication Number Publication Date
FR2183557A1 FR2183557A1 (en) 1973-12-21
FR2183557B3 true FR2183557B3 (enrdf_load_stackoverflow) 1975-08-01

Family

ID=9098281

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7216677A Granted FR2183557A1 (en) 1972-05-10 1972-05-10 Cathodic sputtering appts - with number of chambers for simultaneous treatment of several substrates

Country Status (1)

Country Link
FR (1) FR2183557A1 (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2594102B1 (fr) * 1986-02-12 1991-04-19 Stein Heurtey Installation flexible automatisee de traitement thermochimique rapide
US4851095A (en) * 1988-02-08 1989-07-25 Optical Coating Laboratory, Inc. Magnetron sputtering apparatus and process
US5798027A (en) * 1988-02-08 1998-08-25 Optical Coating Laboratory, Inc. Process for depositing optical thin films on both planar and non-planar substrates
US5618388A (en) * 1988-02-08 1997-04-08 Optical Coating Laboratory, Inc. Geometries and configurations for magnetron sputtering apparatus
US5225057A (en) * 1988-02-08 1993-07-06 Optical Coating Laboratory, Inc. Process for depositing optical films on both planar and non-planar substrates

Also Published As

Publication number Publication date
FR2183557A1 (en) 1973-12-21

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Legal Events

Date Code Title Description
ST Notification of lapse