FR2148245A1 - - Google Patents
Info
- Publication number
- FR2148245A1 FR2148245A1 FR7228084A FR7228084A FR2148245A1 FR 2148245 A1 FR2148245 A1 FR 2148245A1 FR 7228084 A FR7228084 A FR 7228084A FR 7228084 A FR7228084 A FR 7228084A FR 2148245 A1 FR2148245 A1 FR 2148245A1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DD15697371 | 1971-08-04 | ||
| GB1611472A GB1391842A (en) | 1971-08-04 | 1972-04-07 | Apparatus for coating substrates by cathode sputtering and for cleaning by ion bombardment in the same vacuum vessel |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2148245A1 true FR2148245A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1973-03-11 |
| FR2148245B1 FR2148245B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1976-05-14 |
Family
ID=25747417
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7228084A Expired FR2148245B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1971-08-04 | 1972-08-03 |
Country Status (4)
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4137141A (en) * | 1976-11-18 | 1979-01-30 | Loic Henry G | Process for producing a silicon nitride diffusion barrier on a semiconductor substrate, particularly III-V semiconductor substrates |
| EP0014819A1 (en) * | 1978-12-20 | 1980-09-03 | Advanced Coating Technology, Inc. | Sputtering cathode and system for sputter-coating large area substrates |
| FR2559507A1 (fr) * | 1984-02-11 | 1985-08-16 | Glyco Metall Werke | Procede de fabrication de materiau stratifie ou de pieces stratifiees |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1570380A (en) * | 1978-05-30 | 1980-07-02 | Standard Telephones Cables Ltd | Electroless plating |
| DD153497A3 (de) * | 1980-02-08 | 1982-01-13 | Georg Rudakoff | Verfahren und vorrichtung zum plasmaaetzen oder zur plasma cvd |
| DE3041551A1 (de) * | 1980-11-04 | 1982-06-09 | Siemens AG, 1000 Berlin und 8000 München | Elektroden fuer plasma-aetzanlage |
| DE3306738A1 (de) * | 1983-02-25 | 1984-08-30 | Berna AG Olten, Olten | Vorrichtung und verfahren zur beschichtung von substraten mittels glimmentladung, sowie deren anwendung |
| IL127236A0 (en) * | 1997-11-26 | 1999-09-22 | Vapor Technologies Inc | Apparatus for sputtering or arc evaporation |
| EP2081212B1 (en) * | 2008-01-16 | 2016-03-23 | Applied Materials, Inc. | Double-Coating Device with one Process Chamber |
| US9175383B2 (en) | 2008-01-16 | 2015-11-03 | Applied Materials, Inc. | Double-coating device with one process chamber |
| WO2018010770A1 (en) * | 2016-07-12 | 2018-01-18 | Applied Materials, Inc. | Sputter deposition source, sputter deposition apparatus and method of operating a sputter deposition source |
| GB202119151D0 (en) * | 2021-12-31 | 2022-02-16 | Spts Technologies Ltd | Method of operating a pvd apparatus |
-
1972
- 1972-04-07 GB GB1611472A patent/GB1391842A/en not_active Expired
- 1972-05-03 DE DE19722221600 patent/DE2221600A1/de active Pending
- 1972-06-08 CH CH853472A patent/CH553259A/xx not_active IP Right Cessation
- 1972-08-03 FR FR7228084A patent/FR2148245B1/fr not_active Expired
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4137141A (en) * | 1976-11-18 | 1979-01-30 | Loic Henry G | Process for producing a silicon nitride diffusion barrier on a semiconductor substrate, particularly III-V semiconductor substrates |
| EP0014819A1 (en) * | 1978-12-20 | 1980-09-03 | Advanced Coating Technology, Inc. | Sputtering cathode and system for sputter-coating large area substrates |
| FR2559507A1 (fr) * | 1984-02-11 | 1985-08-16 | Glyco Metall Werke | Procede de fabrication de materiau stratifie ou de pieces stratifiees |
Also Published As
| Publication number | Publication date |
|---|---|
| GB1391842A (en) | 1975-04-23 |
| FR2148245B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1976-05-14 |
| CH553259A (de) | 1974-08-30 |
| DE2221600A1 (de) | 1973-02-15 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |