FR2139667A1 - Diffused base transistor - with a source of recombination centres - Google Patents
Diffused base transistor - with a source of recombination centresInfo
- Publication number
- FR2139667A1 FR2139667A1 FR7119574A FR7119574A FR2139667A1 FR 2139667 A1 FR2139667 A1 FR 2139667A1 FR 7119574 A FR7119574 A FR 7119574A FR 7119574 A FR7119574 A FR 7119574A FR 2139667 A1 FR2139667 A1 FR 2139667A1
- Authority
- FR
- France
- Prior art keywords
- diffused
- layer
- source
- transistor
- base
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D99/00—Subject matter not provided for in other groups of this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
- H10W10/01—Manufacture or treatment
Landscapes
- Bipolar Transistors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7119574A FR2139667A1 (en) | 1971-05-28 | 1971-05-28 | Diffused base transistor - with a source of recombination centres |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7119574A FR2139667A1 (en) | 1971-05-28 | 1971-05-28 | Diffused base transistor - with a source of recombination centres |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2139667A1 true FR2139667A1 (en) | 1973-01-12 |
| FR2139667B1 FR2139667B1 (online.php) | 1977-11-18 |
Family
ID=9077830
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7119574A Granted FR2139667A1 (en) | 1971-05-28 | 1971-05-28 | Diffused base transistor - with a source of recombination centres |
Country Status (1)
| Country | Link |
|---|---|
| FR (1) | FR2139667A1 (online.php) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2318500A1 (fr) * | 1975-07-18 | 1977-02-11 | Tokyo Shibaura Electric Co | Circuit a transistors a effet de champ a metal-oxyde-semi-conducteur complementaire et son procede de fabrication |
-
1971
- 1971-05-28 FR FR7119574A patent/FR2139667A1/fr active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2318500A1 (fr) * | 1975-07-18 | 1977-02-11 | Tokyo Shibaura Electric Co | Circuit a transistors a effet de champ a metal-oxyde-semi-conducteur complementaire et son procede de fabrication |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2139667B1 (online.php) | 1977-11-18 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US3664896A (en) | Deposited silicon diffusion sources | |
| GB1421212A (en) | Semiconductor device manufacture | |
| GB1271035A (en) | Processes for forming semiconductor devices and individual semiconductor bodies from a single wafer | |
| GB1335814A (en) | Transistor and method of manufacturing the same | |
| GB1338358A (en) | Semiconductor devices | |
| US3481801A (en) | Isolation technique for integrated circuits | |
| GB1357432A (en) | Semiconductor devices | |
| GB1444633A (en) | Semiconductor integrated circuits | |
| GB1239684A (online.php) | ||
| GB1483801A (en) | Planar diffusion process for manufacturing monolithic integrated circuits | |
| GB1468131A (en) | Method of doping a semiconductor body | |
| GB1379975A (en) | Methods of manufacturing a semiconductor device comprising a voltagedependant capacitance diode | |
| US3767487A (en) | Method of producing igfet devices having outdiffused regions and the product thereof | |
| ES363412A1 (es) | Metodo de fabricacion de dispositivos semiconductores mono-liticos. | |
| GB1073551A (en) | Integrated circuit comprising a diode and method of making the same | |
| US3660732A (en) | Semiconductor structure with dielectric and air isolation and method | |
| GB1217472A (en) | Integrated circuits | |
| ES404807A1 (es) | Procedimiento epitaxil para la produccion de circuitos in- tegrados lineales de potencia. | |
| US3974516A (en) | Method of manufacturing a semiconductor device having at least one insulated gate field effect transistor, and semiconductor device manufactured by using the method | |
| GB1308013A (en) | Methods of manufacturing semiconductor devices | |
| GB1501896A (en) | Semiconductor device | |
| US3826698A (en) | Process for forming a pedestal base transistor | |
| GB1127161A (en) | Improvements in or relating to diffused base transistors | |
| GB1054331A (online.php) | ||
| GB1339384A (en) | Method for the manufacturing of a semiconductor device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |