FR2135428A1 - Mask for lithographic plates - comprising opaque metal and transparent metal oxide zones - Google Patents

Mask for lithographic plates - comprising opaque metal and transparent metal oxide zones

Info

Publication number
FR2135428A1
FR2135428A1 FR7116051A FR7116051A FR2135428A1 FR 2135428 A1 FR2135428 A1 FR 2135428A1 FR 7116051 A FR7116051 A FR 7116051A FR 7116051 A FR7116051 A FR 7116051A FR 2135428 A1 FR2135428 A1 FR 2135428A1
Authority
FR
France
Prior art keywords
zones
metal
mask
opaque
transparent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7116051A
Other languages
English (en)
French (fr)
Other versions
FR2135428B1 (enExample
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Societe Europeenne de Semi Conducteurs de Microelectronique SA SESCOSEM
Original Assignee
Societe Europeenne de Semi Conducteurs de Microelectronique SA SESCOSEM
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Societe Europeenne de Semi Conducteurs de Microelectronique SA SESCOSEM filed Critical Societe Europeenne de Semi Conducteurs de Microelectronique SA SESCOSEM
Priority to FR7116051A priority Critical patent/FR2135428A1/fr
Publication of FR2135428A1 publication Critical patent/FR2135428A1/fr
Application granted granted Critical
Publication of FR2135428B1 publication Critical patent/FR2135428B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
FR7116051A 1971-05-04 1971-05-04 Mask for lithographic plates - comprising opaque metal and transparent metal oxide zones Granted FR2135428A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7116051A FR2135428A1 (en) 1971-05-04 1971-05-04 Mask for lithographic plates - comprising opaque metal and transparent metal oxide zones

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7116051A FR2135428A1 (en) 1971-05-04 1971-05-04 Mask for lithographic plates - comprising opaque metal and transparent metal oxide zones

Publications (2)

Publication Number Publication Date
FR2135428A1 true FR2135428A1 (en) 1972-12-22
FR2135428B1 FR2135428B1 (enExample) 1973-08-10

Family

ID=9076400

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7116051A Granted FR2135428A1 (en) 1971-05-04 1971-05-04 Mask for lithographic plates - comprising opaque metal and transparent metal oxide zones

Country Status (1)

Country Link
FR (1) FR2135428A1 (enExample)

Also Published As

Publication number Publication date
FR2135428B1 (enExample) 1973-08-10

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Legal Events

Date Code Title Description
ST Notification of lapse