FR2109747A5 - - Google Patents

Info

Publication number
FR2109747A5
FR2109747A5 FR7132347A FR7132347A FR2109747A5 FR 2109747 A5 FR2109747 A5 FR 2109747A5 FR 7132347 A FR7132347 A FR 7132347A FR 7132347 A FR7132347 A FR 7132347A FR 2109747 A5 FR2109747 A5 FR 2109747A5
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7132347A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of FR2109747A5 publication Critical patent/FR2109747A5/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
FR7132347A 1970-10-15 1971-09-02 Expired FR2109747A5 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19702050590 DE2050590C2 (en) 1970-10-15 1970-10-15 Projection device

Publications (1)

Publication Number Publication Date
FR2109747A5 true FR2109747A5 (en) 1972-05-26

Family

ID=5785178

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7132347A Expired FR2109747A5 (en) 1970-10-15 1971-09-02

Country Status (4)

Country Link
JP (1) JPS5410826B1 (en)
DE (1) DE2050590C2 (en)
FR (1) FR2109747A5 (en)
GB (1) GB1315256A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0018249A1 (en) * 1979-04-23 1980-10-29 Thomson-Csf Illumination device for producing from a predetermined surface zone a divergent light bundle, and a motive transfer system comprising such a device

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2413551C2 (en) * 1974-03-21 1985-03-21 Western Electric Co., Inc., New York, N.Y. Device for correcting the position of a photosensitive surface in a mask projection device
DE2460914C2 (en) * 1974-12-21 1983-08-18 Ibm Deutschland Gmbh, 7000 Stuttgart Photolithographic projection apparatus
DE2633297A1 (en) * 1976-07-23 1978-01-26 Siemens Ag AUTOMATIC ADJUSTMENT PROCEDURE
US5729331A (en) * 1993-06-30 1998-03-17 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
US6157497A (en) * 1993-06-30 2000-12-05 Nikon Corporation Exposure apparatus
KR0143814B1 (en) * 1995-03-28 1998-07-01 이대원 Semiconductor exposure equipment
GB2333849B (en) * 1995-04-14 1999-10-06 Nikon Corp Exposure apparatus
JP3506158B2 (en) 1995-04-14 2004-03-15 株式会社ニコン Exposure apparatus, scanning exposure apparatus, and scanning exposure method

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3449049A (en) * 1966-01-14 1969-06-10 Ibm High resolution multiple image camera and method of fabricating integrated circuit masks

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0018249A1 (en) * 1979-04-23 1980-10-29 Thomson-Csf Illumination device for producing from a predetermined surface zone a divergent light bundle, and a motive transfer system comprising such a device
FR2455298A1 (en) * 1979-04-23 1980-11-21 Thomson Csf ILLUMINATOR DEVICE FOR PROVIDING A DIVERGING ILLUMINATION BEAM FROM A PREDETERMINED AREA OF A PLAN AND PATTERN TRANSFER SYSTEM COMPRISING SUCH A DEVICE

Also Published As

Publication number Publication date
DE2050590C2 (en) 1982-06-16
DE2050590A1 (en) 1972-04-20
GB1315256A (en) 1973-05-02
JPS5410826B1 (en) 1979-05-10

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Legal Events

Date Code Title Description
ST Notification of lapse