FR2101061B2 - - Google Patents

Info

Publication number
FR2101061B2
FR2101061B2 FR7030040A FR7030040A FR2101061B2 FR 2101061 B2 FR2101061 B2 FR 2101061B2 FR 7030040 A FR7030040 A FR 7030040A FR 7030040 A FR7030040 A FR 7030040A FR 2101061 B2 FR2101061 B2 FR 2101061B2
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7030040A
Other languages
French (fr)
Other versions
FR2101061A2 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Priority to FR7030040A priority Critical patent/FR2101061B2/fr
Priority to US00160725A priority patent/US3732796A/en
Priority to DE19712134144 priority patent/DE2134144A1/en
Publication of FR2101061A2 publication Critical patent/FR2101061A2/fr
Application granted granted Critical
Publication of FR2101061B2 publication Critical patent/FR2101061B2/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/106—Beam splitting or combining systems for splitting or combining a plurality of identical beams or images, e.g. image replication
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/14—Beam splitting or combining systems operating by reflection only
    • G02B27/145—Beam splitting or combining systems operating by reflection only having sequential partially reflecting surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
FR7030040A 1970-07-09 1970-08-14 Expired FR2101061B2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
FR7030040A FR2101061B2 (en) 1970-08-14 1970-08-14
US00160725A US3732796A (en) 1970-07-09 1971-07-08 Line tracing systems using laser energy for exposing photo-sensitive substrates
DE19712134144 DE2134144A1 (en) 1970-07-09 1971-07-08 Opto-electric writing system for the production of microcircuits

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7030040A FR2101061B2 (en) 1970-08-14 1970-08-14

Publications (2)

Publication Number Publication Date
FR2101061A2 FR2101061A2 (en) 1972-03-31
FR2101061B2 true FR2101061B2 (en) 1973-11-23

Family

ID=9060237

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7030040A Expired FR2101061B2 (en) 1970-07-09 1970-08-14

Country Status (1)

Country Link
FR (1) FR2101061B2 (en)

Also Published As

Publication number Publication date
FR2101061A2 (en) 1972-03-31

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