FR2077584A1 - - Google Patents

Info

Publication number
FR2077584A1
FR2077584A1 FR7047538A FR7047538A FR2077584A1 FR 2077584 A1 FR2077584 A1 FR 2077584A1 FR 7047538 A FR7047538 A FR 7047538A FR 7047538 A FR7047538 A FR 7047538A FR 2077584 A1 FR2077584 A1 FR 2077584A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7047538A
Other versions
FR2077584B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Howson Algraphy Ltd
Original Assignee
Howson Algraphy Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Howson Algraphy Ltd filed Critical Howson Algraphy Ltd
Publication of FR2077584A1 publication Critical patent/FR2077584A1/fr
Application granted granted Critical
Publication of FR2077584B1 publication Critical patent/FR2077584B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/695—Compositions containing azides as the photosensitive substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
FR707047538A 1970-01-02 1970-12-31 Expired FR2077584B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB30770 1970-01-02

Publications (2)

Publication Number Publication Date
FR2077584A1 true FR2077584A1 (fr) 1971-10-29
FR2077584B1 FR2077584B1 (fr) 1973-02-02

Family

ID=9702085

Family Applications (1)

Application Number Title Priority Date Filing Date
FR707047538A Expired FR2077584B1 (fr) 1970-01-02 1970-12-31

Country Status (7)

Country Link
AT (1) AT310782B (fr)
BE (1) BE761155A (fr)
DE (1) DE2064552A1 (fr)
FR (1) FR2077584B1 (fr)
GB (1) GB1335343A (fr)
NL (1) NL7018857A (fr)
ZA (1) ZA708605B (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0161660A3 (en) * 1984-05-14 1987-05-20 Kabushiki Kaisha Toshiba Pattern forming method and composition for pattern formation to be used therefor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0161660A3 (en) * 1984-05-14 1987-05-20 Kabushiki Kaisha Toshiba Pattern forming method and composition for pattern formation to be used therefor

Also Published As

Publication number Publication date
BE761155A (fr) 1971-05-27
DE2064552A1 (de) 1971-07-15
NL7018857A (fr) 1971-07-06
AT310782B (de) 1973-10-10
FR2077584B1 (fr) 1973-02-02
ZA708605B (en) 1971-09-29
GB1335343A (en) 1973-10-24

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Legal Events

Date Code Title Description
ST Notification of lapse