FR2076540A5 - - Google Patents

Info

Publication number
FR2076540A5
FR2076540A5 FR7001798A FR7001798A FR2076540A5 FR 2076540 A5 FR2076540 A5 FR 2076540A5 FR 7001798 A FR7001798 A FR 7001798A FR 7001798 A FR7001798 A FR 7001798A FR 2076540 A5 FR2076540 A5 FR 2076540A5
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7001798A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BOKOV JURY
EROPEEV BORIS
JURINA OLGA
LARINA ANASTASIA
LAVRISCHEV VADIM
NAUMOVA SOFIA
VIKULINA NINEL
YAROVAVA GALINA
Original Assignee
BOKOV JURY
EROPEEV BORIS
JURINA OLGA
LARINA ANASTASIA
LAVRISCHEV VADIM
NAUMOVA SOFIA
VIKULINA NINEL
YAROVAVA GALINA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from SU1231856A external-priority patent/SU330421A1/ru
Application filed by BOKOV JURY, EROPEEV BORIS, JURINA OLGA, LARINA ANASTASIA, LAVRISCHEV VADIM, NAUMOVA SOFIA, VIKULINA NINEL, YAROVAVA GALINA filed Critical BOKOV JURY
Application granted granted Critical
Publication of FR2076540A5 publication Critical patent/FR2076540A5/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/22—Compounds containing nitrogen bound to another nitrogen atom
    • C08K5/23—Azo-compounds
    • C08K5/235—Diazo and polyazo compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
FR7001798A 1968-04-11 1970-01-19 Expired FR2076540A5 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SU1231856A SU330421A1 (ru) 1968-04-11 Светочувствительный материал

Publications (1)

Publication Number Publication Date
FR2076540A5 true FR2076540A5 (fr) 1971-10-15

Family

ID=20442226

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7001798A Expired FR2076540A5 (fr) 1968-04-11 1970-01-19

Country Status (3)

Country Link
US (1) US3674496A (fr)
FR (1) FR2076540A5 (fr)
GB (1) GB1259761A (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3948667A (en) * 1971-06-21 1976-04-06 Japan Synthetic Rubber Company Limited Photosensitive compositions

Also Published As

Publication number Publication date
DE2000628A1 (de) 1971-07-22
US3674496A (en) 1972-07-04
GB1259761A (en) 1972-01-12

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Legal Events

Date Code Title Description
ST Notification of lapse