FR2057914A5 - - Google Patents

Info

Publication number
FR2057914A5
FR2057914A5 FR7028449A FR7028449A FR2057914A5 FR 2057914 A5 FR2057914 A5 FR 2057914A5 FR 7028449 A FR7028449 A FR 7028449A FR 7028449 A FR7028449 A FR 7028449A FR 2057914 A5 FR2057914 A5 FR 2057914A5
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7028449A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Application granted granted Critical
Publication of FR2057914A5 publication Critical patent/FR2057914A5/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G69/00—Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
    • C08G69/48—Polymers modified by chemical after-treatment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polyamides (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Graft Or Block Polymers (AREA)
FR7028449A 1969-08-05 1970-07-31 Expired FR2057914A5 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP44061423A JPS4825424B1 (fr) 1969-08-05 1969-08-05

Publications (1)

Publication Number Publication Date
FR2057914A5 true FR2057914A5 (fr) 1971-05-21

Family

ID=13170650

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7028449A Expired FR2057914A5 (fr) 1969-08-05 1970-07-31

Country Status (4)

Country Link
US (1) US3764501A (fr)
JP (1) JPS4825424B1 (fr)
FR (1) FR2057914A5 (fr)
GB (1) GB1295145A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0133266A2 (fr) * 1983-07-30 1985-02-20 BASF Aktiengesellschaft Procédé pour la fabrication de formes en relief utilisant des amides spéciaux

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4001016A (en) * 1971-05-25 1977-01-04 Agfa-Gevaert, A.G. Polymers which can be cross-linked by photopolymerization
US4018937A (en) * 1972-12-14 1977-04-19 Rca Corporation Electron beam recording comprising polymer of 1-methylvinyl methyl ketone
US4012536A (en) * 1972-12-14 1977-03-15 Rca Corporation Electron beam recording medium comprising 1-methylvinyl methyl ketone
US4218294A (en) * 1973-09-24 1980-08-19 Design Cote Corp. Radiation curable coating composition
FR2314900A1 (fr) * 1975-06-18 1977-01-14 Niso Ste Civile Etud Rech Procede et installation de traitement des solutions de decapage de metaux
JPS5614554A (en) * 1979-07-13 1981-02-12 Kanegafuchi Chem Ind Co Ltd Heat resistant resin composition
US4563507A (en) * 1982-03-31 1986-01-07 Intera Corporation Treatment of Lewis base polymer with ethylenically unsaturated compound to improve antistatic hygroscopic and dye receptive properties
JPS5756259A (en) * 1980-09-19 1982-04-03 Dainippon Printing Co Ltd Manufacture of gravure plate
US4975498A (en) * 1988-12-14 1990-12-04 Union Camp Corporation Thermally-curable aminoamide acrylate polymer
US4987160A (en) * 1989-01-31 1991-01-22 Union Camp Corporation Radiation-curable aminoamide acrylate polymer
US6743273B2 (en) * 2000-09-05 2004-06-01 Donaldson Company, Inc. Polymer, polymer microfiber, polymer nanofiber and applications including filter structures
US20100175555A1 (en) * 2008-09-12 2010-07-15 Ismael Ferrer Polyamide Fine Fibers
US20120142887A1 (en) * 2010-12-03 2012-06-07 Basf Se Crosslinked polyamides
CN117649863B (zh) * 2023-12-06 2024-06-11 四川大学 含poss纳米材料的光致聚合物全息存储材料、制备方法及应用

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0133266A2 (fr) * 1983-07-30 1985-02-20 BASF Aktiengesellschaft Procédé pour la fabrication de formes en relief utilisant des amides spéciaux
EP0133266A3 (en) * 1983-07-30 1985-10-16 Basf Aktiengesellschaft Process for the production of relief forms with special amides

Also Published As

Publication number Publication date
JPS4825424B1 (fr) 1973-07-28
US3764501A (en) 1973-10-09
GB1295145A (fr) 1972-11-01

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Legal Events

Date Code Title Description
ST Notification of lapse