FR2024258A1 - - Google Patents

Info

Publication number
FR2024258A1
FR2024258A1 FR6940505A FR6940505A FR2024258A1 FR 2024258 A1 FR2024258 A1 FR 2024258A1 FR 6940505 A FR6940505 A FR 6940505A FR 6940505 A FR6940505 A FR 6940505A FR 2024258 A1 FR2024258 A1 FR 2024258A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR6940505A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Airco Inc
Original Assignee
Air Reduction Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Reduction Co Inc filed Critical Air Reduction Co Inc
Publication of FR2024258A1 publication Critical patent/FR2024258A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
FR6940505A 1968-11-26 1969-11-25 Withdrawn FR2024258A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US78061368A 1968-11-26 1968-11-26

Publications (1)

Publication Number Publication Date
FR2024258A1 true FR2024258A1 (en) 1970-08-28

Family

ID=25120102

Family Applications (1)

Application Number Title Priority Date Filing Date
FR6940505A Withdrawn FR2024258A1 (en) 1968-11-26 1969-11-25

Country Status (3)

Country Link
US (1) US3607222A (en)
DE (1) DE1959411A1 (en)
FR (1) FR2024258A1 (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE795116A (en) * 1972-02-08 1973-05-29 Cockerill EVAPORATION BATH FEEDING PROCESS
DE2821130C2 (en) * 1978-05-13 1985-12-12 Leybold-Heraeus GmbH, 5000 Köln Evaporation crucible with supply of the evaporation material in the form of rods through the bottom of the crucible
US4518418A (en) * 1983-06-10 1985-05-21 Duval Corporation Electron beam refinement of metals, particularly copper
US4488902A (en) * 1983-06-10 1984-12-18 Duval Corporation Horizontal, multistage electron beam refinement of metals with recycle
US4762975A (en) * 1984-02-06 1988-08-09 Phrasor Scientific, Incorporated Method and apparatus for making submicrom powders
US5021084A (en) * 1987-02-24 1991-06-04 Bianchi Leonard M Process for improving high-temperature alloys
EP0368037B1 (en) * 1988-11-10 1994-07-06 Balzers Aktiengesellschaft Process for controlling the distribution of the evaporation rate of an electron beam
GB2248852A (en) * 1990-10-16 1992-04-22 Secr Defence Vapour deposition
US5503655A (en) * 1994-02-23 1996-04-02 Orbit Technologies, Inc. Low cost titanium production
EP0785291A1 (en) * 1996-01-19 1997-07-23 The Boc Group, Inc. Electron beam evaporation system
FR2771756B1 (en) * 1997-12-03 1999-12-31 Lorraine Laminage METHOD OF VACUUM DEPOSITION OF A CHROME-IRON-BASED ALLOY AND USE FOR TREATING THE SURFACE OF ZINC-PLATED STEEL SHEET
US6145470A (en) * 1998-12-11 2000-11-14 General Electric Company Apparatus for electron beam physical vapor deposition
US6824585B2 (en) * 2002-12-03 2004-11-30 Adrian Joseph Low cost high speed titanium and its alloy production
US7509734B2 (en) * 2003-03-03 2009-03-31 United Technologies Corporation Repairing turbine element
KR101174874B1 (en) * 2010-01-06 2012-08-17 삼성디스플레이 주식회사 Deposition source, apparatus for thin layer deposition and method of manufacturing organic light emitting display apparatus
CN113348264A (en) * 2018-11-20 2021-09-03 博斯特曼彻斯特有限公司 Evaporation vessel control system, PVD machine and method for operating PVD machine

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3024965A (en) * 1957-10-08 1962-03-13 Milleron Norman Apparatus for vacuum deposition of metals
US3170019A (en) * 1962-01-15 1965-02-16 Stauffer Chemical Co Electron beam furnace
US3230110A (en) * 1962-01-22 1966-01-18 Temescal Metallurgical Corp Method of forming carbon vapor barrier
DE1228807B (en) * 1964-02-12 1966-11-17 Alcatel Sa Melting process by electron bombardment and device for this
US3390249A (en) * 1965-09-20 1968-06-25 Air Reduction Vaporization monitoring apparatus

Also Published As

Publication number Publication date
DE1959411A1 (en) 1970-06-18
US3607222A (en) 1971-09-21

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Legal Events

Date Code Title Description
ST Notification of lapse