FR1597032A - - Google Patents

Info

Publication number
FR1597032A
FR1597032A FR1597032DA FR1597032A FR 1597032 A FR1597032 A FR 1597032A FR 1597032D A FR1597032D A FR 1597032DA FR 1597032 A FR1597032 A FR 1597032A
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Other languages
French (fr)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Application granted granted Critical
Publication of FR1597032A publication Critical patent/FR1597032A/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
FR1597032D 1968-06-05 1968-12-23 Expired FR1597032A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19681769520 DE1769520A1 (en) 1968-06-05 1968-06-05 Process for the epitaxial deposition of crystalline material from the gas phase, in particular for semiconductor purposes

Publications (1)

Publication Number Publication Date
FR1597032A true FR1597032A (en) 1970-06-22

Family

ID=5700164

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1597032D Expired FR1597032A (en) 1968-06-05 1968-12-23

Country Status (8)

Country Link
JP (1) JPS5149191B1 (en)
AT (1) AT288811B (en)
CH (1) CH521163A (en)
DE (1) DE1769520A1 (en)
FR (1) FR1597032A (en)
GB (1) GB1260233A (en)
NL (1) NL6906275A (en)
SE (1) SE356905B (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4096821A (en) * 1976-12-13 1978-06-27 Westinghouse Electric Corp. System for fabricating thin-film electronic components
FR2498813A1 (en) * 1981-01-27 1982-07-30 Instruments Sa EQUIPMENT TREATMENT FACILITY FOR SEMICONDUCTOR PRODUCTION
FR2567919A1 (en) * 1984-07-23 1986-01-24 Int Standard Electric Corp SYSTEM FOR PRODUCING LAYERED SEMICONDUCTOR MATERIAL STRUCTURES

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2722545C2 (en) * 1977-05-18 1984-03-08 Kurt Dr.-Ing. 7802 Merzhausen Heber Diffusion furnace for the treatment of semiconductor substrates
DE2800574A1 (en) * 1978-01-07 1979-07-12 Stanley Electric Co Ltd Ear examination instrument with needle like probe - has battery housed in with socket to receive plug for electrode
DE2830589C2 (en) * 1978-07-12 1985-04-18 Ibm Deutschland Gmbh, 7000 Stuttgart Continuous furnace for processing semiconductor wafers
DE2849240C2 (en) * 1978-11-13 1983-01-13 Siemens Ag, 1000 Berlin Und 8000 Muenchen CVD coating device for small parts and their use
JPS6169116A (en) * 1984-09-13 1986-04-09 Toshiba Ceramics Co Ltd Susceptor for continuous cvd coating on silicon wafer
GB2196650A (en) * 1986-10-27 1988-05-05 Prutec Ltd Cadmium sulphide solar cells
DE3907610A1 (en) * 1989-03-09 1990-09-13 Telefunken Electronic Gmbh Epitaxial process
JP2999751B2 (en) 1997-06-27 2000-01-17 三星電子株式会社 Apparatus and method for producing silica film
JP5698059B2 (en) * 2011-04-08 2015-04-08 株式会社日立国際電気 Substrate processing apparatus and solar cell manufacturing method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4096821A (en) * 1976-12-13 1978-06-27 Westinghouse Electric Corp. System for fabricating thin-film electronic components
FR2498813A1 (en) * 1981-01-27 1982-07-30 Instruments Sa EQUIPMENT TREATMENT FACILITY FOR SEMICONDUCTOR PRODUCTION
EP0060151A1 (en) * 1981-01-27 1982-09-15 Instruments S.A. Material treatment apparatus for producing semiconductors
FR2567919A1 (en) * 1984-07-23 1986-01-24 Int Standard Electric Corp SYSTEM FOR PRODUCING LAYERED SEMICONDUCTOR MATERIAL STRUCTURES

Also Published As

Publication number Publication date
AT288811B (en) 1971-03-25
GB1260233A (en) 1972-01-12
JPS5149191B1 (en) 1976-12-24
SE356905B (en) 1973-06-12
DE1769520A1 (en) 1972-03-02
NL6906275A (en) 1969-12-09
CH521163A (en) 1972-04-15

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Legal Events

Date Code Title Description
ST Notification of lapse