FR1581671A - - Google Patents

Info

Publication number
FR1581671A
FR1581671A FR159044A FR1581671DA FR1581671A FR 1581671 A FR1581671 A FR 1581671A FR 159044 A FR159044 A FR 159044A FR 1581671D A FR1581671D A FR 1581671DA FR 1581671 A FR1581671 A FR 1581671A
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR159044A
Other languages
French (fr)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Application granted granted Critical
Publication of FR1581671A publication Critical patent/FR1581671A/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
FR159044A 1968-07-12 1968-07-12 Expired FR1581671A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR159044 1968-07-12

Publications (1)

Publication Number Publication Date
FR1581671A true FR1581671A (de) 1969-09-19

Family

ID=8652502

Family Applications (1)

Application Number Title Priority Date Filing Date
FR159044A Expired FR1581671A (de) 1968-07-12 1968-07-12

Country Status (1)

Country Link
FR (1) FR1581671A (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0003929A2 (de) * 1978-02-27 1979-09-05 Claude Fleurent Photographisches Verfahren zur Herstellung von Mustern auf einem mit einer photographischen Emulsion versehenen Träger, Zeichnung und Entwicklung der Muster bei Tageslicht, Produkte und Apparat für dieses Verfahren

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0003929A2 (de) * 1978-02-27 1979-09-05 Claude Fleurent Photographisches Verfahren zur Herstellung von Mustern auf einem mit einer photographischen Emulsion versehenen Träger, Zeichnung und Entwicklung der Muster bei Tageslicht, Produkte und Apparat für dieses Verfahren
EP0003929A3 (de) * 1978-02-27 1979-09-19 Claude Fleurent Photographisches Verfahren zur Herstellung von Mustern auf einem mit einer photographischen Emulsion versehenen Träger, Zeichnung und Entwicklung der Muster bei Tageslicht, Produkte und Apparat für dieses Verfahren

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Legal Events

Date Code Title Description
ST Notification of lapse