FR1552904A - - Google Patents

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Publication number
FR1552904A
FR1552904A FR1552904DA FR1552904A FR 1552904 A FR1552904 A FR 1552904A FR 1552904D A FR1552904D A FR 1552904DA FR 1552904 A FR1552904 A FR 1552904A
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Other languages
French (fr)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Application granted granted Critical
Publication of FR1552904A publication Critical patent/FR1552904A/fr
Expired legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21H—OBTAINING ENERGY FROM RADIOACTIVE SOURCES; APPLICATIONS OF RADIATION FROM RADIOACTIVE SOURCES, NOT OTHERWISE PROVIDED FOR; UTILISING COSMIC RADIATION
    • G21H5/00—Applications of radiation from radioactive sources or arrangements therefor, not otherwise provided for 
FR1552904D 1967-09-15 1967-09-15 Expired FR1552904A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR121223 1967-09-15

Publications (1)

Publication Number Publication Date
FR1552904A true FR1552904A (en) 1969-01-10

Family

ID=8638440

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1552904D Expired FR1552904A (en) 1967-09-15 1967-09-15

Country Status (1)

Country Link
FR (1) FR1552904A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0315152A2 (en) * 1987-11-03 1989-05-10 AUSIMONT S.r.l. Photoablation process for films based on polymers having a perfluoroalkylpolyether structure by means of excimer laser rays

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0315152A2 (en) * 1987-11-03 1989-05-10 AUSIMONT S.r.l. Photoablation process for films based on polymers having a perfluoroalkylpolyether structure by means of excimer laser rays
EP0315152A3 (en) * 1987-11-03 1990-09-05 AUSIMONT S.r.l. Photoablation process for films based on polymers having a perfluoroalkylpolyether structure by means of excimer laser rays

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Legal Events

Date Code Title Description
ST Notification of lapse