FR1541499A - Method and apparatus for monitoring vapor density by spectroscopy - Google Patents

Method and apparatus for monitoring vapor density by spectroscopy

Info

Publication number
FR1541499A
FR1541499A FR125207A FR125207A FR1541499A FR 1541499 A FR1541499 A FR 1541499A FR 125207 A FR125207 A FR 125207A FR 125207 A FR125207 A FR 125207A FR 1541499 A FR1541499 A FR 1541499A
Authority
FR
France
Prior art keywords
spectroscopy
vapor density
monitoring vapor
monitoring
density
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR125207A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Airco Inc
Original Assignee
Air Reduction Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Reduction Co Inc filed Critical Air Reduction Co Inc
Priority to FR125207A priority Critical patent/FR1541499A/en
Application granted granted Critical
Publication of FR1541499A publication Critical patent/FR1541499A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/544—Controlling the film thickness or evaporation rate using measurement in the gas phase
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
    • H01J41/02—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas
    • H01J41/04—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas with ionisation by means of thermionic cathodes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
FR125207A 1966-10-31 1967-10-20 Method and apparatus for monitoring vapor density by spectroscopy Expired FR1541499A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR125207A FR1541499A (en) 1966-10-31 1967-10-20 Method and apparatus for monitoring vapor density by spectroscopy

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US59073666A 1966-10-31 1966-10-31
FR125207A FR1541499A (en) 1966-10-31 1967-10-20 Method and apparatus for monitoring vapor density by spectroscopy

Publications (1)

Publication Number Publication Date
FR1541499A true FR1541499A (en) 1968-10-04

Family

ID=26180169

Family Applications (1)

Application Number Title Priority Date Filing Date
FR125207A Expired FR1541499A (en) 1966-10-31 1967-10-20 Method and apparatus for monitoring vapor density by spectroscopy

Country Status (1)

Country Link
FR (1) FR1541499A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2339857A1 (en) * 1976-01-30 1977-08-26 Leybold Heraeus Inficon EVAPORATION PROCESS CONTROL METHOD AND DEVICE
FR2503190A1 (en) * 1981-03-31 1982-10-08 Nippon Sheet Glass Co Ltd PROCESS AND APPARATUS FOR FORMING AN OXIDE LAYER ON A SUPPORT BY A SPRAYING TECHNIQUE WITH REACTION
FR2888587A1 (en) * 2005-07-13 2007-01-19 Sidel Sas APPARATUS FOR THE PECVD DEPOSITION OF AN INTERNAL BARRIER LAYER ON A CONTAINER, COMPRISING AN OPTICAL ANALYSIS DEVICE FOR PLASMA

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2339857A1 (en) * 1976-01-30 1977-08-26 Leybold Heraeus Inficon EVAPORATION PROCESS CONTROL METHOD AND DEVICE
FR2503190A1 (en) * 1981-03-31 1982-10-08 Nippon Sheet Glass Co Ltd PROCESS AND APPARATUS FOR FORMING AN OXIDE LAYER ON A SUPPORT BY A SPRAYING TECHNIQUE WITH REACTION
FR2888587A1 (en) * 2005-07-13 2007-01-19 Sidel Sas APPARATUS FOR THE PECVD DEPOSITION OF AN INTERNAL BARRIER LAYER ON A CONTAINER, COMPRISING AN OPTICAL ANALYSIS DEVICE FOR PLASMA
WO2007006977A3 (en) * 2005-07-13 2007-03-22 Sidel Participations Apparatus for the pecvd deposition of an inner barrier layer on a container, comprising an optical plasma analysis device
US8826853B2 (en) 2005-07-13 2014-09-09 Sidel Participations Apparatus for PECVD deposition of an internal barrier layer on a receptacle, the apparatus including an optical plasma analysis device

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