FR1529444A - Dispositif d'alignement précis de masques sur des éléments semi-conducteurs - Google Patents

Dispositif d'alignement précis de masques sur des éléments semi-conducteurs

Info

Publication number
FR1529444A
FR1529444A FR112444A FR112444A FR1529444A FR 1529444 A FR1529444 A FR 1529444A FR 112444 A FR112444 A FR 112444A FR 112444 A FR112444 A FR 112444A FR 1529444 A FR1529444 A FR 1529444A
Authority
FR
France
Prior art keywords
masks
semiconductor elements
precise alignment
precise
alignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR112444A
Other languages
English (en)
Inventor
Manfred Borner
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Telefunken Patentverwertungs GmbH
Original Assignee
Telefunken Patentverwertungs GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Telefunken Patentverwertungs GmbH filed Critical Telefunken Patentverwertungs GmbH
Priority to FR112444A priority Critical patent/FR1529444A/fr
Application granted granted Critical
Publication of FR1529444A publication Critical patent/FR1529444A/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/682—Mask-wafer alignment

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
FR112444A 1966-07-01 1967-06-29 Dispositif d'alignement précis de masques sur des éléments semi-conducteurs Expired FR1529444A (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR112444A FR1529444A (fr) 1966-07-01 1967-06-29 Dispositif d'alignement précis de masques sur des éléments semi-conducteurs

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DET0031500 1966-07-01
FR112444A FR1529444A (fr) 1966-07-01 1967-06-29 Dispositif d'alignement précis de masques sur des éléments semi-conducteurs

Publications (1)

Publication Number Publication Date
FR1529444A true FR1529444A (fr) 1968-06-14

Family

ID=26000198

Family Applications (1)

Application Number Title Priority Date Filing Date
FR112444A Expired FR1529444A (fr) 1966-07-01 1967-06-29 Dispositif d'alignement précis de masques sur des éléments semi-conducteurs

Country Status (1)

Country Link
FR (1) FR1529444A (fr)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2065508A1 (fr) * 1969-10-24 1971-07-30 Westinghouse Electric Corp
DE2111213A1 (de) * 1970-03-11 1971-09-30 Zumbach Electronic Automatic Verfahren und Einrichtung zur beruehrungslosen Messung einer Schichtdicke
JPS491177A (fr) * 1972-04-17 1974-01-08
JPS541552B1 (fr) * 1970-04-22 1979-01-25

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2065508A1 (fr) * 1969-10-24 1971-07-30 Westinghouse Electric Corp
DE2111213A1 (de) * 1970-03-11 1971-09-30 Zumbach Electronic Automatic Verfahren und Einrichtung zur beruehrungslosen Messung einer Schichtdicke
JPS541552B1 (fr) * 1970-04-22 1979-01-25
JPS491177A (fr) * 1972-04-17 1974-01-08
JPS5620690B2 (fr) * 1972-04-17 1981-05-15

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