FR1492442A - Process for the production of relief shapes for printing - Google Patents
Process for the production of relief shapes for printingInfo
- Publication number
- FR1492442A FR1492442A FR75229A FR75229A FR1492442A FR 1492442 A FR1492442 A FR 1492442A FR 75229 A FR75229 A FR 75229A FR 75229 A FR75229 A FR 75229A FR 1492442 A FR1492442 A FR 1492442A
- Authority
- FR
- France
- Prior art keywords
- printing
- production
- relief shapes
- relief
- shapes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0387—Polyamides or polyimides
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR75229A FR1492442A (en) | 1965-09-08 | 1966-09-05 | Process for the production of relief shapes for printing |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19651447931 DE1447931A1 (en) | 1965-09-08 | 1965-09-08 | Process for the production of relief forms for printing purposes |
DEB0083633 | 1965-09-08 | ||
FR75229A FR1492442A (en) | 1965-09-08 | 1966-09-05 | Process for the production of relief shapes for printing |
Publications (1)
Publication Number | Publication Date |
---|---|
FR1492442A true FR1492442A (en) | 1967-08-18 |
Family
ID=27180693
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR75229A Expired FR1492442A (en) | 1965-09-08 | 1966-09-05 | Process for the production of relief shapes for printing |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR1492442A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4115128A (en) | 1975-12-26 | 1978-09-19 | Fuji Photo Film Co., Ltd. | Positive image forming radiation sensitive compositions containing diazide compound and organic cyclic anhydride |
-
1966
- 1966-09-05 FR FR75229A patent/FR1492442A/en not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4115128A (en) | 1975-12-26 | 1978-09-19 | Fuji Photo Film Co., Ltd. | Positive image forming radiation sensitive compositions containing diazide compound and organic cyclic anhydride |
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