FR1489630A - Process for the treatment of semiconductor materials and semiconductor devices obtained by the process - Google Patents
Process for the treatment of semiconductor materials and semiconductor devices obtained by the processInfo
- Publication number
- FR1489630A FR1489630A FR73341A FR73341A FR1489630A FR 1489630 A FR1489630 A FR 1489630A FR 73341 A FR73341 A FR 73341A FR 73341 A FR73341 A FR 73341A FR 1489630 A FR1489630 A FR 1489630A
- Authority
- FR
- France
- Prior art keywords
- treatment
- semiconductor
- devices obtained
- semiconductor devices
- semiconductor materials
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 title 2
- 239000000463 material Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR73341A FR1489630A (en) | 1965-08-17 | 1966-08-17 | Process for the treatment of semiconductor materials and semiconductor devices obtained by the process |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US48045265A | 1965-08-17 | 1965-08-17 | |
FR73341A FR1489630A (en) | 1965-08-17 | 1966-08-17 | Process for the treatment of semiconductor materials and semiconductor devices obtained by the process |
Publications (1)
Publication Number | Publication Date |
---|---|
FR1489630A true FR1489630A (en) | 1967-07-21 |
Family
ID=26172626
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR73341A Expired FR1489630A (en) | 1965-08-17 | 1966-08-17 | Process for the treatment of semiconductor materials and semiconductor devices obtained by the process |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR1489630A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1991003834A1 (en) * | 1989-09-05 | 1991-03-21 | Mcnc | Method for selectively depositing material on substrates |
-
1966
- 1966-08-17 FR FR73341A patent/FR1489630A/en not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1991003834A1 (en) * | 1989-09-05 | 1991-03-21 | Mcnc | Method for selectively depositing material on substrates |
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