FR1476976A - Procédé de fabrication de couches de monocristaux de sélénium orientés avec précision - Google Patents

Procédé de fabrication de couches de monocristaux de sélénium orientés avec précision

Info

Publication number
FR1476976A
FR1476976A FR58389A FR58389A FR1476976A FR 1476976 A FR1476976 A FR 1476976A FR 58389 A FR58389 A FR 58389A FR 58389 A FR58389 A FR 58389A FR 1476976 A FR1476976 A FR 1476976A
Authority
FR
France
Prior art keywords
single crystals
precisely oriented
manufacturing layers
selenium single
selenium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR58389A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Noranda Inc
Original Assignee
Noranda Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB16596/65A external-priority patent/GB1109471A/en
Application filed by Noranda Inc filed Critical Noranda Inc
Priority to FR58389A priority Critical patent/FR1476976A/fr
Application granted granted Critical
Publication of FR1476976A publication Critical patent/FR1476976A/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/06—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising selenium or tellurium in uncombined form other than as impurities in semiconductor bodies of other materials
    • H01L21/10—Preliminary treatment of the selenium or tellurium, its application to the foundation plate, or the subsequent treatment of the combination
    • H01L21/101—Application of the selenium or tellurium to the foundation plate
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B19/00—Liquid-phase epitaxial-layer growth
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02367—Substrates
    • H01L21/0237—Materials
    • H01L21/02425—Conductive materials, e.g. metallic silicides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02521—Materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02656—Special treatments
    • H01L21/02658—Pretreatments
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/06—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising selenium or tellurium in uncombined form other than as impurities in semiconductor bodies of other materials

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
FR58389A 1965-04-20 1966-04-20 Procédé de fabrication de couches de monocristaux de sélénium orientés avec précision Expired FR1476976A (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR58389A FR1476976A (fr) 1965-04-20 1966-04-20 Procédé de fabrication de couches de monocristaux de sélénium orientés avec précision

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB16596/65A GB1109471A (en) 1965-04-20 1965-04-20 Improvements relating to single crystal films
FR58389A FR1476976A (fr) 1965-04-20 1966-04-20 Procédé de fabrication de couches de monocristaux de sélénium orientés avec précision

Publications (1)

Publication Number Publication Date
FR1476976A true FR1476976A (fr) 1967-04-14

Family

ID=26170097

Family Applications (1)

Application Number Title Priority Date Filing Date
FR58389A Expired FR1476976A (fr) 1965-04-20 1966-04-20 Procédé de fabrication de couches de monocristaux de sélénium orientés avec précision

Country Status (1)

Country Link
FR (1) FR1476976A (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2212177A1 (fr) * 1972-12-29 1974-07-26 Ibm
FR2435515A1 (fr) * 1978-09-07 1980-04-04 Itt Procede et dispositif pour la cristallisation de materiau semi-conducteur en forme de feuille ou de bande et element semi-conducteur ainsi obtenu
CN115084290A (zh) * 2022-07-06 2022-09-20 中国科学院化学研究所 一种多晶硒薄膜及其制备方法和一种太阳能电池

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2212177A1 (fr) * 1972-12-29 1974-07-26 Ibm
FR2435515A1 (fr) * 1978-09-07 1980-04-04 Itt Procede et dispositif pour la cristallisation de materiau semi-conducteur en forme de feuille ou de bande et element semi-conducteur ainsi obtenu
CN115084290A (zh) * 2022-07-06 2022-09-20 中国科学院化学研究所 一种多晶硒薄膜及其制备方法和一种太阳能电池
CN115084290B (zh) * 2022-07-06 2023-07-25 中国科学院化学研究所 一种多晶硒薄膜及其制备方法和一种太阳能电池

Similar Documents

Publication Publication Date Title
GB1124202A (en) Method of manufacturing semiconductor devices
FR1505766A (fr) Procédé de fabrication de diodes
FR1458851A (fr) Procédé de production de couches supraconductrices
CH463254A (fr) Procédé de fabrication de caillé
BE575837A (fr) Procédé de fabrication de monocristaux semi-conducteurs.
FR1476976A (fr) Procédé de fabrication de couches de monocristaux de sélénium orientés avec précision
FR1463727A (fr) Procédé de fabrication de matières photoconductrices
FR1469738A (fr) Procédé perfectionné de fabrication du 4-méthylpentène-1
FR1507392A (fr) Procédé de fabrication de bandes supraconductrices
FR1460817A (fr) Procédé de fabrication de couches photosensibles
FR1505505A (fr) Procédé de fabrication de polyuréthane microporeux
FR1466881A (fr) Composé de lydimycine et son procédé de fabrication
FR1469158A (fr) Procédé de fabrication de monocristaux de ferrite
FR1502973A (fr) Procédé de fabrication de p-aminobenzamides substituées
FR1406131A (fr) Procédé de fabrication de couches photosensibles pour la diazotypie
FR1481554A (fr) Procédé de fabrication de stratifiés
FR1480895A (fr) Procédé de fabrication de gonadiènes substitués
FR2116916A5 (fr) Procede de fabrication de monocristaux de composes semiconducteurs
FR1486828A (fr) Procédé de fabrication de supports de magnétogrammes
CH450453A (fr) Procédé de fabrication du N-dipropylacétate de choline
FR1408593A (fr) Procédé de fabrication de minces couches ferromagnétiques
FR1394567A (fr) Procédé de fabrication de nappes composées de plusieurs couches
FR1497686A (fr) Procédé de fabrication de caillé
FR1545313A (fr) Procédé de fabrication de chloro-pyrimidines
FR1487510A (fr) Procédé de fabrication de gonénols et gonadiénols substitués