FR1475466A - Procédé de fabrication de clichés lithographiques secs - Google Patents
Procédé de fabrication de clichés lithographiques secsInfo
- Publication number
- FR1475466A FR1475466A FR57309A FR57309A FR1475466A FR 1475466 A FR1475466 A FR 1475466A FR 57309 A FR57309 A FR 57309A FR 57309 A FR57309 A FR 57309A FR 1475466 A FR1475466 A FR 1475466A
- Authority
- FR
- France
- Prior art keywords
- manufacturing process
- lithographic plates
- dry lithographic
- dry
- plates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/003—Printing plates or foils; Materials therefor with ink abhesive means or abhesive forming means, such as abhesive siloxane or fluoro compounds, e.g. for dry lithographic printing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/04—Chromates
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR57309A FR1475466A (fr) | 1965-10-11 | 1966-04-12 | Procédé de fabrication de clichés lithographiques secs |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US49476865A | 1965-10-11 | 1965-10-11 | |
FR57309A FR1475466A (fr) | 1965-10-11 | 1966-04-12 | Procédé de fabrication de clichés lithographiques secs |
US70628668A | 1968-02-19 | 1968-02-19 |
Publications (1)
Publication Number | Publication Date |
---|---|
FR1475466A true FR1475466A (fr) | 1967-03-31 |
Family
ID=27243103
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR57309A Expired FR1475466A (fr) | 1965-10-11 | 1966-04-12 | Procédé de fabrication de clichés lithographiques secs |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR1475466A (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL6800167A (fr) * | 1967-01-06 | 1968-07-08 |
-
1966
- 1966-04-12 FR FR57309A patent/FR1475466A/fr not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL6800167A (fr) * | 1967-01-06 | 1968-07-08 |
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