FR1461531A - Semiconductor device manufacturing process - Google Patents

Semiconductor device manufacturing process

Info

Publication number
FR1461531A
FR1461531A FR34480A FR34480A FR1461531A FR 1461531 A FR1461531 A FR 1461531A FR 34480 A FR34480 A FR 34480A FR 34480 A FR34480 A FR 34480A FR 1461531 A FR1461531 A FR 1461531A
Authority
FR
France
Prior art keywords
semiconductor device
manufacturing process
device manufacturing
semiconductor
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR34480A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp filed Critical Matsushita Electronics Corp
Priority to FR34480A priority Critical patent/FR1461531A/en
Application granted granted Critical
Publication of FR1461531A publication Critical patent/FR1461531A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/14—Removing excess of molten coatings; Controlling or regulating the coating thickness
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/24—Alloying of impurity materials, e.g. doping materials, electrode materials, with a semiconductor body

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
FR34480A 1964-10-12 1965-10-11 Semiconductor device manufacturing process Expired FR1461531A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR34480A FR1461531A (en) 1964-10-12 1965-10-11 Semiconductor device manufacturing process

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP5841764 1964-10-12
FR34480A FR1461531A (en) 1964-10-12 1965-10-11 Semiconductor device manufacturing process

Publications (1)

Publication Number Publication Date
FR1461531A true FR1461531A (en) 1966-02-25

Family

ID=26166690

Family Applications (1)

Application Number Title Priority Date Filing Date
FR34480A Expired FR1461531A (en) 1964-10-12 1965-10-11 Semiconductor device manufacturing process

Country Status (1)

Country Link
FR (1) FR1461531A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2363190A1 (en) * 1976-08-30 1978-03-24 Rca Corp PROCESS FOR SELECTIVE DOPING A SEMICONDUCTOR BODY
CN113696024A (en) * 2021-07-22 2021-11-26 杨方勇 Polishing and dipping device of graphite substrate profile for heat sink sheet

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2363190A1 (en) * 1976-08-30 1978-03-24 Rca Corp PROCESS FOR SELECTIVE DOPING A SEMICONDUCTOR BODY
CN113696024A (en) * 2021-07-22 2021-11-26 杨方勇 Polishing and dipping device of graphite substrate profile for heat sink sheet
CN113696024B (en) * 2021-07-22 2023-08-11 山东卓越高新材料科技有限公司 Polishing and impregnating device for graphite substrate profile for heat sink

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