FR1459893A - A method of producing thin layers by deposition the spraying aid - Google Patents

A method of producing thin layers by deposition the spraying aid

Info

Publication number
FR1459893A
FR1459893A FR29001A FR29001A FR1459893A FR 1459893 A FR1459893 A FR 1459893A FR 29001 A FR29001 A FR 29001A FR 29001 A FR29001 A FR 29001A FR 1459893 A FR1459893 A FR 1459893A
Authority
FR
France
Prior art keywords
deposition
method
thin layers
producing thin
spraying aid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR29001A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BALZERS HOCHVAKUUM
Siemens Schuckertwerke AG
Siemens AG
Balzers AG
Original Assignee
BALZERS HOCHVAKUUM
Siemens Schuckertwerke AG
Siemens AG
Balzers AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to DEB0078233 priority Critical
Application filed by BALZERS HOCHVAKUUM, Siemens Schuckertwerke AG, Siemens AG, Balzers AG filed Critical BALZERS HOCHVAKUUM
Priority to FR29001A priority patent/FR1459893A/en
Application granted granted Critical
Publication of FR1459893A publication Critical patent/FR1459893A/en
Application status is Expired legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/35Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/3471Introduction of auxiliary energy into the plasma
    • C23C14/3478Introduction of auxiliary energy into the plasma using electrons, e.g. triode sputtering
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
    • H01J37/34Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions operating with cathodic sputtering
    • H01J37/3402Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions operating with cathodic sputtering using supplementary magnetic fields
FR29001A 1964-08-22 1965-08-20 A method of producing thin layers by deposition the spraying aid Expired FR1459893A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
DEB0078233 1964-08-22
FR29001A FR1459893A (en) 1964-08-22 1965-08-20 A method of producing thin layers by deposition the spraying aid

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR29001A FR1459893A (en) 1964-08-22 1965-08-20 A method of producing thin layers by deposition the spraying aid

Publications (1)

Publication Number Publication Date
FR1459893A true FR1459893A (en) 1966-06-17

Family

ID=25967200

Family Applications (1)

Application Number Title Priority Date Filing Date
FR29001A Expired FR1459893A (en) 1964-08-22 1965-08-20 A method of producing thin layers by deposition the spraying aid

Country Status (1)

Country Link
FR (1) FR1459893A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2218652A1 (en) * 1973-02-20 1974-09-13 Thomson Csf
FR2423065A1 (en) * 1978-04-12 1979-11-09 Battelle Memorial Institute Method of manufacturing electrodes for fuel cells, a device for the implementation of the method and electrodes resulting from this process
WO1985002866A1 (en) * 1983-12-23 1985-07-04 Ion Tech Limited Sputter deposition

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2218652A1 (en) * 1973-02-20 1974-09-13 Thomson Csf
FR2423065A1 (en) * 1978-04-12 1979-11-09 Battelle Memorial Institute Method of manufacturing electrodes for fuel cells, a device for the implementation of the method and electrodes resulting from this process
WO1985002866A1 (en) * 1983-12-23 1985-07-04 Ion Tech Limited Sputter deposition

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