FR1452523A - Procédé de dépôt de pellicules par projection cathodique - Google Patents

Procédé de dépôt de pellicules par projection cathodique

Info

Publication number
FR1452523A
FR1452523A FR37093A FR37093A FR1452523A FR 1452523 A FR1452523 A FR 1452523A FR 37093 A FR37093 A FR 37093A FR 37093 A FR37093 A FR 37093A FR 1452523 A FR1452523 A FR 1452523A
Authority
FR
France
Prior art keywords
deposition process
film deposition
projection film
cathodic
cathodic projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR37093A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TRW Semiconductors Inc
Original Assignee
TRW Semiconductors Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TRW Semiconductors Inc filed Critical TRW Semiconductors Inc
Priority to FR37093A priority Critical patent/FR1452523A/fr
Application granted granted Critical
Publication of FR1452523A publication Critical patent/FR1452523A/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
FR37093A 1965-11-03 1965-11-03 Procédé de dépôt de pellicules par projection cathodique Expired FR1452523A (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR37093A FR1452523A (fr) 1965-11-03 1965-11-03 Procédé de dépôt de pellicules par projection cathodique

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR37093A FR1452523A (fr) 1965-11-03 1965-11-03 Procédé de dépôt de pellicules par projection cathodique

Publications (1)

Publication Number Publication Date
FR1452523A true FR1452523A (fr) 1966-02-25

Family

ID=8591718

Family Applications (1)

Application Number Title Priority Date Filing Date
FR37093A Expired FR1452523A (fr) 1965-11-03 1965-11-03 Procédé de dépôt de pellicules par projection cathodique

Country Status (1)

Country Link
FR (1) FR1452523A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3507766A (en) * 1968-01-19 1970-04-21 Texas Instruments Inc Method of forming a heterogeneous composite insulating layer of silicon dioxide in multilevel integrated circuits

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3507766A (en) * 1968-01-19 1970-04-21 Texas Instruments Inc Method of forming a heterogeneous composite insulating layer of silicon dioxide in multilevel integrated circuits

Similar Documents

Publication Publication Date Title
BR6566503D0 (pt) Processo para a formacao de um revestimento de pelicula
CH510747A (de) Verfahren zum Abscheiden einer Dünnschicht
FR1517840A (fr) Procédé d'enduction
FR1510097A (fr) Procédé d'enduction
FR1439444A (fr) Procédé de formation de films minces par dépôt de vapeurs
FR1489274A (fr) Procédé de photogravure
CH433876A (fr) Procédé de revêtement
FR1503133A (fr) Procédé perfectionné de revêtement de métaux
CH464642A (fr) Procédé de revêtement par électrolyse
CH457208A (fr) Procédé de revêtement
FR1452523A (fr) Procédé de dépôt de pellicules par projection cathodique
FR1426556A (fr) Procédé de photocopie
FR1460990A (fr) Procédé de dépôt électrolytique
FR94315E (fr) Procédé de dépot par laser.
FR1462647A (fr) Procédé de reproduction thermo-graphique
FR1540853A (fr) Procédé de revêtement de films magnétiques
FR1503469A (fr) Procédé de diazotypie
FR1536496A (fr) Procédé de dépôt par laser
FR1426673A (fr) Procédé de photocopie
CH437143A (fr) Procédé de cryo-séchage de matières
FR1426402A (fr) Procédé de dépôt métallique
FR1451329A (fr) Procédé perfectionné de revêtement de surfaces métalliques
FR1443648A (fr) Procédé d'enduisage
FR1460947A (fr) Procédé de peinture par électro-revêtement
FR1395309A (fr) Procédé de revêtement de surfaces verticales