FR1451623A - Method of applying a layer of tetragonal germanium dioxide to a germanium body - Google Patents

Method of applying a layer of tetragonal germanium dioxide to a germanium body

Info

Publication number
FR1451623A
FR1451623A FR33104A FR33104A FR1451623A FR 1451623 A FR1451623 A FR 1451623A FR 33104 A FR33104 A FR 33104A FR 33104 A FR33104 A FR 33104A FR 1451623 A FR1451623 A FR 1451623A
Authority
FR
France
Prior art keywords
germanium
applying
layer
tetragonal
dioxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR33104A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASSOCIATED SEMICONDUCTOR MFT
Original Assignee
ASSOCIATED SEMICONDUCTOR MFT
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASSOCIATED SEMICONDUCTOR MFT filed Critical ASSOCIATED SEMICONDUCTOR MFT
Priority to FR33104A priority Critical patent/FR1451623A/en
Application granted granted Critical
Publication of FR1451623A publication Critical patent/FR1451623A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/32—Anodisation of semiconducting materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
    • C23C8/10—Oxidising
    • C23C8/16—Oxidising using oxygen-containing compounds, e.g. water, carbon dioxide
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/291—Oxides or nitrides or carbides, e.g. ceramics, glass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Electrochemistry (AREA)
  • Ceramic Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
FR33104A 1964-09-29 1965-09-29 Method of applying a layer of tetragonal germanium dioxide to a germanium body Expired FR1451623A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR33104A FR1451623A (en) 1964-09-29 1965-09-29 Method of applying a layer of tetragonal germanium dioxide to a germanium body

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB3961264 1964-09-29
FR33104A FR1451623A (en) 1964-09-29 1965-09-29 Method of applying a layer of tetragonal germanium dioxide to a germanium body

Publications (1)

Publication Number Publication Date
FR1451623A true FR1451623A (en) 1966-01-07

Family

ID=26166457

Family Applications (1)

Application Number Title Priority Date Filing Date
FR33104A Expired FR1451623A (en) 1964-09-29 1965-09-29 Method of applying a layer of tetragonal germanium dioxide to a germanium body

Country Status (1)

Country Link
FR (1) FR1451623A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10626144B2 (en) 2014-09-26 2020-04-21 Nosopharm Peptide derivatives and uses thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10626144B2 (en) 2014-09-26 2020-04-21 Nosopharm Peptide derivatives and uses thereof

Similar Documents

Publication Publication Date Title
FR1335428A (en) Method of applying electroconductive coatings
FR1503527A (en) Method and device for applying a frit to the junction surface of a non-circular section of a cinescope
FR1510728A (en) Method of applying hyaline decals
BE614420A (en) Method of adjusting a quantity to be controlled
BE780913A (en) PROCESS FOR APPLYING A PROTECTIVE LAYER TO A BODY
FR1451623A (en) Method of applying a layer of tetragonal germanium dioxide to a germanium body
CH416091A (en) Method of applying an acrylic polymer to a rigid substrate
BE603689A (en) Method to control and enhance the effect of explosive bodies
FR1359694A (en) Method of applying metal deposits
FR1224318A (en) Method of applying a contact to a semiconductor body
FR1477472A (en) Method of applying a layer of germanium dioxide with a tetragonal crystal structure to a germanium body
FR1357986A (en) Method of applying a covering of materials to a part by spraying
FR1529744A (en) Method and devices for the construction of retractable buildings
FR1425227A (en) Method of applying metals to other metals
FR1391439A (en) Coating composition and method of applying it
FR1364951A (en) Method of applying a layer of gold to a silver object
CH425394A (en) Process of applying zinc to aluminum
FR1367780A (en) Method of forming a monomolecular layer
FR1296913A (en) Method and related means for controlling the verticality of masonry structures
CH443531A (en) Method of making a surface coating composition
FR1315647A (en) Method of adjusting a quantity to be controlled
FR1347959A (en) Continuous formwork and method of applying said formwork
FR1406167A (en) Improved method of applying liquid compositions
FR1433733A (en) Method of depositing a silicon layer
CH422734A (en) Compact body and method of forming this body