FR1422701A - Composition for photoresists and method of preparation - Google Patents

Composition for photoresists and method of preparation

Info

Publication number
FR1422701A
FR1422701A FR3392A FR3392A FR1422701A FR 1422701 A FR1422701 A FR 1422701A FR 3392 A FR3392 A FR 3392A FR 3392 A FR3392 A FR 3392A FR 1422701 A FR1422701 A FR 1422701A
Authority
FR
France
Prior art keywords
photoresists
preparation
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR3392A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Horizons Inc
Original Assignee
Horizons Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US341116A external-priority patent/US3330659A/en
Application filed by Horizons Inc filed Critical Horizons Inc
Priority to FR3392A priority Critical patent/FR1422701A/en
Application granted granted Critical
Publication of FR1422701A publication Critical patent/FR1422701A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
FR3392A 1964-01-29 1965-01-26 Composition for photoresists and method of preparation Expired FR1422701A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR3392A FR1422701A (en) 1964-01-29 1965-01-26 Composition for photoresists and method of preparation

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US341116A US3330659A (en) 1964-01-29 1964-01-29 Photographic product and method of making same
FR3392A FR1422701A (en) 1964-01-29 1965-01-26 Composition for photoresists and method of preparation

Publications (1)

Publication Number Publication Date
FR1422701A true FR1422701A (en) 1965-12-24

Family

ID=26161736

Family Applications (1)

Application Number Title Priority Date Filing Date
FR3392A Expired FR1422701A (en) 1964-01-29 1965-01-26 Composition for photoresists and method of preparation

Country Status (1)

Country Link
FR (1) FR1422701A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3395793A1 (en) * 2017-04-24 2018-10-31 IGM Group B.V. Process for the preparation of alpha-functionalized ketones

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3395793A1 (en) * 2017-04-24 2018-10-31 IGM Group B.V. Process for the preparation of alpha-functionalized ketones
WO2018197325A1 (en) * 2017-04-24 2018-11-01 Igm Group B.V. Process for the preparation of alpha-functionalized ketones
CN110494414A (en) * 2017-04-24 2019-11-22 Igm集团私人有限公司 α-functionalization ketone preparation method
JP2020517583A (en) * 2017-04-24 2020-06-18 アイジーエム グループ ビー．ヴィ． Method for preparing α-functionalized ketone

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